Improved performances of AlN/polyimide hybrid film and its application in redistribution layer

Zhe Liu,Guifu Ding,Jiangbo Luo,Wen Lu,Xiaolin Zhao,Ping Cheng,Yanlei Wang
DOI: https://doi.org/10.1007/s13391-016-6082-5
IF: 3.151
2016-08-01
Electronic Materials Letters
Abstract:The AlN/polyimide (PI) hybrid film was studied as the dielectric layer in the redistribution layer (RDL) in this work. The incorporation of the AlN into the PI matrix was achieved by mechanical ball-milling process. The spin-coating process was used to fabricate the AlN/PI hybrid film, which is compatible with micro-electro-mechanical system (MEMS) technology for fabricating RDL. The AlN/PI hybrid film was characterized by Fourier transform infrared (FTIR) spectrum and thermogravimetric analysis (TGA). The effect of the AlN content on the thermal stability, thermal expansion coefficient, hardness and water adsorption of the AlN/PI hybrid film was studied. The results indicated that the addition of AlN nanoparticles improved the thermal stability and hardness, but decreased the thermal expansion coefficient and water absorption of the pure PI film. As an example of its typical application, the AlN/PI hybrid film with 8 wt.% AlN was patterned using micromachining technology and used as the dielectric layer in RDL successfully.
materials science, multidisciplinary
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