A new metallization method of modified tannic acid photoresist patterning †

Zicheng Tang,Wenbing Kang,Huan Chen,Xubin Guo,Haihua Wang
Abstract:Metal patterning from a modified tannic acid (TA-Boc-MA) photoresist and the processes are designed using protection of hydroxyl groups in tannic acid, formulation into a photoresist, an exposure and pattern treatment process, and metallization by electroless Ag deposition with silver ion solution.
Chemistry,Engineering,Materials Science
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