New metallization method of modified tannic acid photoresist pattern

Zicheng Tang,Wenbing Kang,Huan Chen,Xubin Guo,Haihua Wang

DOI: https://doi.org/10.1039/d3im00066d

Abstract:Metal patterning converted from a modified tannic acid (TA-Boc-MA) photoresist and the processes are designed by protection of hydroxyl groups in tannic acid, formulation into a photoresist, exposure and pattern...

Chemistry,Materials Science

What problem does this paper attempt to address?

A new metallization method of modified tannic acid photoresist patterning †

Zicheng Tang,Wenbing Kang,Huan Chen,Xubin Guo,Haihua Wang

Abstract:Metal patterning from a modified tannic acid (TA-Boc-MA) photoresist and the processes are designed using protection of hydroxyl groups in tannic acid, formulation into a photoresist, an exposure and pattern treatment process, and metallization by electroless Ag deposition with silver ion solution.

Chemistry,Engineering,Materials Science
Highly Sensitive Cationic Photoresist for High-Throughput Two-Photon Nanofabrication

Zhiyuan Ma,Tengxiao Li,Xiaoqiang Dai,Xiaoming Shen,Xiaobing Wang,Huan Fu,Xianmeng Xia,Qinyan Zhu,Yinbo Zhu,Zhilong Yu,Chun Cao,Shangting You,Cuifang Kuang

DOI: https://doi.org/10.1002/adfm.202409859

IF: 19

2024-01-01

Advanced Functional Materials

Abstract:Two-photon lithography (TPL) is a powerful tool for 3D nanofabrication, however, high-throughput TPL remains challenging, especially for cationic-based photoresists. A novel cationic-based photoresist named TP-EO is developed for high-throughput and high-resolution TPL nanofabrication. High-speed fabrication is achieved by using a bimolecular photosensitizer-photo acid generator (PS-PAG) pair that can effectively solve the photosensitivity bottleneck in cationic-based photoresists. High-resolution nanofabrication is achieved by limiting the photoacid diffusion via tuning the monomer's intra- and inter-molecular stereo-structure. The fabrication of 3D structures is demonstrated with fine features (<200 nm), fast writing speed (100 mm s(-1)), and low shrinkage, and showcased the rapid fabrication of centimeter-scale nanodevices. TP-EO photoresist shows outstanding TPL fabrication speed and resolution among cationic-based photoresists, making it a promising solution for high-throughput 3D nanomanufacturing.
Controlled in-situ reduction strategy for synthesis of transparent conductive metal meshes using tannic acid-based photoresists

Xubin Guo,Huan Chen,Haihua Wang,Dong Wang,Qianqian Wang,Wenbing Kang

DOI: https://doi.org/10.1016/j.mee.2024.112196

IF: 2.3

2024-04-24

Microelectronic Engineering

Abstract:Transparent conductive films (TCFs) that converge high transmittance and high conductive properties are essential for many optoelectronic devices, and efforts have been made to acquire films with high transmittance as well as low resistance of the thin layer by low-cost means. Here, we introduce a novel and simple strategy for the controlled in-situ templated synthesis of a transparent conductive metal mesh by utilizing the good reducibility to silver ions of the patterned tannic acid (TA)-based photoresists. To achieve this, mesh patterns with tunable line width were first printed using the TA-based negative photoresists by laser direct writing equipment. Within the patterned domains, the phenolic hydroxyl groups could interact with metal ions and act as reducing agents, thus accelerating the in-situ growth of silver nanoparticles to fabricate silver grids. By changing the line width of the designed patterns and the PH of the plating solution, the metal grids with a high transmission ( T ) of 92.54% and a thin-layer resistance ( R s ) as low as 4.15 Ω sq. −1 are ultimately achieved after annealing treatment. Our description demonstrates a simple and effective approach that is potentially scalable to other materials as well.

engineering, electrical & electronic,nanoscience & nanotechnology,optics,physics, applied
Tunable photo-patterning of organic color-centers

Qingqing Dou,Beibei Xu,Xiaojian Wu,Junyao Mo,YuHuang Wang

DOI: https://doi.org/10.1016/j.matdes.2021.110252

IF: 9.417

2021-01-01

Materials & Design

Abstract:•Photo-patterning strategy is developed to realize scalable localization of color-centers with high spatial accuracy.•Light-stimulation can promote the functionalization of SWCNTs films forming organic color-centers.•The patterns can be modulated by varying the chemical properties of the solvents.
Metal Patterning Based on Femtosecond Laser Direct Writing (Invited)

Maozhang Pang,Yiwei Qiu,Chun Cao,Cuifang Kuang

DOI: https://doi.org/10.3788/cjl231489

2024-01-01

Chinese Journal of Lasers

Abstract:ObjectiveFemtosecond laser direct writing is a new nanofabrication technology. However, achieving high-quality pattern transfer directly on metal surfaces is difficult owing to the photothermal effect between the femtosecond laser and metal, which can result in laser ablation. To address this, we develop a new metal pattern transfer technology that combines femtosecond laser direct writing technology and the lift-off process. This technology enables precise metal pattern transfer at a sub-micron level (0.89 mu m). We explore the effects of femtosecond laser direct writing parameters and development methods and parameters on the performance of metal transfer. We observe that the accuracy of metal transfer increases with higher femtosecond laser exposure doses. Meanwhile, the dry development method outperforms the wet development method. Increasing the development time of the sacrificial layer results in a gradual increase in the transfer line width, accompanied by improved roughness of the line. By incorporating a specific undercut angle in the metal transfer process, we successfully address the edge warpage and high roughness of the metal lines. In this study, a chromium-based transfer grating with 2 inch (1 inch=2.54 cm) diameter is fabricated using the new approach. Additionally, the feasibility of using the prepared chromium pattern as a mask plate is verified using projection exposure on SU-8 photoresist, thus demonstrating the potential of the strategy to locally replace the e-beam lithography for mask plate processing. In addition, Au and Pt patterns are successfully transferred using this approach, demonstrating its universality and wide range of potential applications.MethodsThe lift-off process based on femtosecond laser processing comprises sample preparation, femtosecond laser exposure,development, sputtering of metal, and stripping.1) Sample preparation: The quartz substrate is cleaned using an ultrasonic machine and vacuum plasma machine to remove impurities. Thereafter, a sacrificial layer is spin-coated onto the quartz substrate and baked on a hot plate. Next, photoresist is added dropwise onto the sacrificial layer.2) Femtosecond laser direct writing: A femtosecond laser is used to expose the prepared samples.3) Development: The exposed samples are developed by immersing them successively in propylene glycol methyl ether acetate (PGMEA) and isopropyl alcohol (IPA) to wash away the unexposed photoresist. The sacrificial layer is then removed by immersion in NMD-3 solution. Dry development is performed on a microwave plasma debonder.4) Sputtering of metals: Chromium and gold plating is performed using magnetron sputtering equipment, and platinum plating is performed using a magnetron ion sputtering apparatus.5) Stripping: The residual photoresist and sacrificial layer are removed using the degumming solution, N-methyl pyrrolidone (NMP), through immersion and ultrasonication, followed by rinsing with deionized water. The samples are left to air dry to complete the transfer of the pattern of the metal.Results and DiscussionsThis study explores the effects of sacrificial layer development methods and parameters on chrome transfer. The results in Figs.3(a)-(c) indicate that the wet developing method has many defects and is ineffective, whereas the dry development method achieves high-quality chrome transfer within an optimal development time of 20 min [Figs.3(d)-(f)]. Next, we investigate the effect of femtosecond laser direct writing process parameters on chrome transfer properties. The results show that increasing the exposure dose decreases the width of the chrome lines (Fig.4). At the direct writing speed of 20 mm/s and direct writing power of 47.5 mW, the line width is as small as 890 nm, albeit with warpage at the line edges. To solve these problems, we design and introduce the undercut angle in the photoresist to protect the chrome lines from the negative effects of the lift-off process.Figure 5(c) shows that the transferred chrome line warps severely on both sides without the undercut angle. When the undercut angle is 10 degrees, the edges of the chrome lines are smoother and the chrome lines tightly adhere to the substrate without any warpage [Fig.5(d)].Thereafter, the edge roughness of the chrome lines is reduced by optimizing the sacrificial layer dry-developing process (Fig.6).Finally, we explore the large-area pattern transfer and multi-metal pattern transfer capabilities of this strategy. Combining the femtosecond laser direct-writing technique and lift-off process, we successfully achieve a 2-inch chromium-based transfer grating and verify the feasibility of using the chromium pattern as a mask plate for projected exposure on SU-8 photoresist. Meanwhile, Au and Pt patterns are successfully transferred using this strategy, demonstrating its universality.ConclusionsA novel metal pattern transfer technique is developed by combining femtosecond laser direct writing technology and the lift-off process. In the lift-off process, a sacrificial layer is introduced and a dry development strategy is used to achieve metal pattern transfer with submicron (0.89 mu m) precision. The effects of femtosecond laser direct writing parameters and development methods and parameters on metal transfer are explored. We observe that the accuracy of metal transfer increases with an increase in the femtosecond laser exposure dose. Increasing the development time of the sacrificial layer increases the transfer line width and significantly improves the roughness of the line. Moreover, the problems of edge warpage and high roughness of metal lines are successfully addressed by incorporating a specific undercut angle in the metal transfer process. In addition, a 2-inch chrome-based transfer grating is achieved using the proposed approach. The feasibility of using the prepared chrome pattern as a mask plate for projected exposure on SU-8 photoresist is confirmed. Finally, the successful transfer of Au and Pt patterns demonstrates the universality of this approach
Synthesis of acrylated tannic acid as bio-based adhesion promoter in UV-curable coating with improved corrosion resistance

Xiaoyu Wang,Jiaqi Zhang,Jingcheng Liu,Ren Liu,Jing Luo

DOI: https://doi.org/10.1016/j.colsurfa.2022.128834

2022-07-01

Abstract:Aiming to developing UV-curable coatings with high performance on metal surface, acrylated tannic acid (TA-GMA) was developed to be a new bio-based adhesion promoter, which was synthesized via the ring opening reaction of tannic acid (TA) and glycidyl methacylate (GMA). The acrylation of TA not only improve the compatibility of TA with UV-curable resin, but also participate in the photo-curing process, which could act as a "bridge" between the coating and the metal substrate. The structure of TA-GMA was determined by FT-IR and 1H-NMR. The adhesion promotion effects of TA-GMA for UV-curable coatings on metal substrates were investigated with cross-hatch test and pull off analysis. The results showed that TA-GMA could significantly improve the adhesion strength between UV-cured coatings and metal substrates. The pull-off strength increased from 0.44 MPa to 1.65 MPa for low carbon steel plate and from 0.13 MPa to 1.11 MPa for aluminum plate with the presence of TA-GMA, respectively. A significant increase in cross-hatch adhesion level was also observed. Accompanied with the remarkably improved adhesion performance, the corrosion protection properties of the UV-cured coating with TA-GMA were significantly enhanced from both electrochemical impedance spectroscopy (EIS) test and salt spray results.

chemistry, physical
Laccase-immobilized tannic acid-mediated surface modification of halloysite nanotubes for efficient bisphenol-A degradation

Liting Zhang,Wen Tang,Tonghao Ma,Lina Zhou,Chenggong Hui,Xiaoli Wang,Ping Wang,Changai Zhang,Chao Chen

DOI: https://doi.org/10.1039/c9ra06171a

IF: 4.036

2019-01-01

RSC Advances

Abstract:We report a simple tannic acid (TA)-mediated surface modification strategy for the fabrication of HNT-based efficient enzyme immobilization supports.

chemistry, multidisciplinary
Evaluation of Nano-Patterning Performance of Water-Soluble Material for Photoresist Using Sugar Chain

Toru Amano,Daiki Hirata,Yumi Hasegawa,Satoshi Takei

DOI: https://doi.org/10.2494/photopolymer.33.445

2020-07-01

Journal of Photopolymer Science and Technology

Abstract:Hydroxyl groups of dextrin, which is a base polymer, were modified with photosensitive groups to the extent that water solubility could be maintained, and water-soluble plant-derived photosensitive materials were created. This material can be applied to a silicon wafer using spin coating, exposed by a mask contact exposure system (LTCET-500: Litho Tech Japan), and then developed with water to enable fine processing, which is derived from plants for photolithography. It has been demonstrated that adaptation to water-soluble nanopatterning materials is possible. Since the base polymer is derived from plants and does not use organic solvents or highly toxic strong alkaline developers, it is useful as a low environmental load patterning material.

polymer science
An Oxygen-Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by Uv-Nanoimprint Lithography

Xin Hu,Shisong Huang,Ronghua Gu,Changsheng Yuan,Haixiong Ge,Yanfeng Chen

DOI: https://doi.org/10.1002/marc.201400251

IF: 5.006

2014-01-01

Macromolecular Rapid Communications

Abstract:In this paper, an oxygen-insensitive degradable resist for UV-nanoimprint is designed, comprising a polycyclic degradable acrylate monomer, 2,10-diacryloyloxymethyl-1,4,9,12-tetraoxaspiro [4.2.4.2] tetradecane (DAMTT), and a multifunctional thiol monomer pentaerythritol tetra(3-mercaptopropionate) (PETMP). The resist can be quickly UV-cured in the air atmosphere and achieve a high monomer conversion of over 98%, which greatly reduce the adhesion force between the resist and the soft mold. High conversion, in company with an adequate Young's modulus (about 1 GPa) and an extremely low shrinkage (1.34%), promises high nanoimprint resolution of sub-50 nm. The cross-linked resist is able to break into linear molecules in a hot acid solvent. As a result, metallic patterns are fabricated on highly curved surfaces via the lift off process without the assistance of a thermoplastic polymer layer.
Tannic Acid Selective Modulation Defects to Enhance the Photocatalytic CO2 Reduction Activity of Layered Double Hydroxides

He Cui,Xiaoqian Wu,Shunli Li,Jiabo Wang,Ruoxue Wang,Yi Zhao,Kai Ge,YiDong Hu,Boxiong Shen,Yongfang Yang

DOI: https://doi.org/10.1002/smll.202407221

IF: 13.3

2024-10-19

Small

Abstract:The selective construction of inactive metal and oxygen‐deficient double vacancies (V metal & OH) on layered double hydroxides (LDH) by a simple and controllable approach using tannic acid (TA) solution resulted in the presence of abundant coordination unsaturated metal active sites with high catalytic activity. This approach provides a general strategy for functionalizing LDH to enhance the photoelectric conversion capacity. Recently, layered double hydroxides (LDH) have shown great potential in photoreduction of CO2 owing to its flexible structural adjustability. In this study, the mild acidic property of tannic acid (TA) is exploited to etch the bimetal LDH to create abundant vacancies to gain the coordination unsaturated active centers. Based on the different chelating abilities of TA to various metal ions, the active metals are remained by selective chelation while the inert metals are removed during the etching process of bimetal LDH. Furthermore, selective chelating with metal ions not only increases the percentage of highly active metals but also compensates for the structural damage caused by the etch, which achieves a scalpel‐like selective construction of vacancies. The NiAl‐LDH etched and functionalized by TA for 3 h exhibits superior photo‐reduction of CO2 performance without co‐catalysts and photo‐sensitizers, which is 14 times that of the pristine NiAl‐LDH. The fact that many bimetal LDHs can be functionalized by TA and exhibit significantly improved photocatalytic efficiency is confirmed, suggesting this strategy is generalized to functionalize double‐ or multi‐metal LDH. The method provided in this work opens the door for polyphenol‐functionalized LDHs to enhance their ability for light‐driven chemical transformations.

materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
Patterned anodic aluminium oxide fabricated with a Ta mask

Xiaowei Zhao,Peng Jiang,Sishen Xie,Jiafeng Feng,Yan Gao,Jianxiong Wang,Dongfang Liu,Li Song,Lifeng Liu,Xinyuan Dou,Shudong Luo,Zengxing Zhang,Yanjuan Xiang,Weiya Zhou,Gang Wang

DOI: https://doi.org/10.1088/0957-4484/17/1/007

IF: 3.5

2006-01-01

Nanotechnology

Abstract:Electrochemical anodization was applied to an aluminium (Al) sheet patterned with a metallic tantalum (Ta) mask, which gave rise to the formation of patterned anodic aluminium oxide (AAO). The morphological evolution of the AAO porous structure with anodizing time was characterized by scanning electron microscopy. Lateral anodizing of the Al sheet gradually developed underneath the metallic Ta mask with the increase of anodizing time. This has given us further understanding of the Al anodizing behaviour compared with our previous work with a SiO2 masked Al sheet. By controlling the anodizing time and the size of the metal mask, deep lithography of the Al substrate can be realized, and a mushroom-like Ta-Al microstructure with a high aspect ratio was created on the Al surface after removal of the AAO film. This Ta-Al microstructure has been studied in detail, and it was found to exhibit pronounced hydrophobic properties.
Polyphenol‐Induced Adhesive Liquid Metal Inks for Substrate‐Independent Direct Pen Writing

Arifur Rahim,Franco Centurion,Jialuo Han,Roozbeh Abbasi,Mohannad Mayyas,Jing Sun,Michael J. Christoe,Dorna Esrafilzadeh,Francois‐Marie Allioux,Mohammad B. Ghasemian,Jiong Yang,Jianbo Tang,Torben Daeneke,Srinivas Mettu,Jin Zhang,Hemayet Uddin,Rouhollah Jalili,Kourosh Kalantar‐Zadeh,Md. Arifur Rahim,Md Hemayet Uddin

DOI: https://doi.org/10.1002/adfm.202007336

IF: 19

2020-12-11

Advanced Functional Materials

Abstract:<p>Surface patterning of liquid metals (LMs) is a key processing step for LM‐based functional systems. Current patterning methods are substrate specific and largely suffer from undesired imperfections—restricting their widespread applications. Inspired by the universal catechol adhesion chemistry observed in nature, LM inks stabilized by the assembly of a naturally abundant polyphenol, tannic acid, has been developed. The intrinsic adhesive properties of tannic acid containing multiple catechol/gallol groups, allow the inks to be applied to a variety of substrates ranging from flexible to rigid, metallic to plastics and flat to curved, even using a ballpoint pen. This method can be further extended from hand‐written texts to complex conductive patterns using an automated setup. In addition, capacitive touch and hazardous heavy metal ion sensors have been patterned, leveraging from the synergistic combination of polyphenols and LMs. Overall, this strategy provides a unique platform to manipulate LMs from hand‐written pattern to complex designs onto the substrate of choice, that has remained challenging to achieve otherwise.</p>

materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
Progress in Novel Surface Pretreatment and Studying Method of Organic Coated Metals

张金涛,胡吉明,张鉴清,曹楚南

DOI: https://doi.org/10.3969/j.issn.1001-3660.2005.01.001

2005-01-01

Surface Technology

Abstract:Silanization and in situ phosphatization techniques of the metal surface developed in recent years are presented. The review on investigating methods of degradation behavior of organic coated metals, such as infrared photography and the combination of scanning kelvin probe (SKP) and scanning acoustic microscopy (SAM), is also provided. Both metal surface pretreatments can provide enhanced adhesion between organic coatings and metallic substrates and probably replace the conventional phosphatizing and chromatizing techniques which are dangerous to the health of human being and environments in industrial application. Infrared photography can give insight into the process of degradation and corrosive types of coated metals. Combination of SKP and SAM can be used to detect the changes of corrosion potential and micro-regions in the interface of coated metals.
28nm Metal Hard Mask etch process development

Yu Zhang,Chen-guang Gai,Shugen Pen,Xu Zhang,Q. Ge,Liyan Zhang,Jun Huang,H.-R. Ren

DOI: https://doi.org/10.1109/CSTIC.2015.7153376

2015-03-15

Abstract:Metal Hard Mask (MHM)-All In One (AIO) technology has been widely used in the process flow of copper inter-connect since 28 nm technology node and below. This is because AF immersion exposure technology reaches its limitation for line edge roughness control, photoresist (PR) thickness and profile control. In this paper, we described the issues and the solutions in the development of 28 nm node MHM etch process, including selectivity improvement for photoresist, optimization of line edge roughness (LER), and optimization of TiN profile & CD uniformity. Base on fundamental etch theory, several experiments were conducted, and we successfully achieved TiN with desired profile and CD with good uniformity for 28nm MHM process.

Engineering,Materials Science
Modification of Hydrotalcite Loading Tannic Acid with Organic Silane and Application in Anticorrosive Epoxy Coating

Bui Minh Quy,Nguyen Thuy Chinh,Nguyen Thi Kim Anh,Vu Thi Tuyet,Nguyen Xuan Thai,Vu Quoc Trung,Ngo Thi Cam Quyen,Nguyen Ngoc Tan,Thai Hoang

DOI: https://doi.org/10.1002/open.202400120

ChemistryOpen

Abstract:Metal corrosion is a challenge for the world with heavy impacts on the economy. Study on the development of effectiveness anticorrosion additives is a promising strategery for the protection industry. This research focuses on the modification of hydrotalcite Mg-Al (HT) loading tannic acid (TA) with 3-(trimethoxy silyl) propyl methacrylate organo-silane (TMSPM) for applicating as an anti-corrosion additive for epoxy coating on the steel substrate. The suitable ratio of HT and modifiers was investigated and the suitable content of modified HT in epoxy matrix was found based on mechanical properties of the epoxy-based coating. The characteristics of modified HT were assessed through infrared (IR) spectroscopy, X-ray diffraction pattern (XRD), scanning electron microscopy (SEM), thermal gravimetry analysis (TGA), water contact angle (WCA), dynamic light scattering (DLS). Detailly, HT-TA3-S3 shows good stability in distilled water when HT/TA was modified with TMSPM which makes Zeta potential decreases significantly. Besides, SEM analysis presented HT-TA-S has a cylindrical shape about of 500 nm. Moreover, the crystallite size of HT/TA after being modified by TMSPM decreases sharply. All of these prove successfully synthesize HT loading TA with modified TMSPM. Water contact angle (WCA) decreases in case of loading TA and increases in case of modifying with TMSPM (WCA changed from HT (116.3°) to HT-TA (102.4°) and HT-TA-S (120.1°) which indicates the increased hydrophobicity of the sample. The obtained results showed HT/TA was modified successfully with TMSPM. The modification affected the size distribution and surface properties of HT nanoparticles while it did not impact on the crystal structure of HT. After incorporating modified HT/TA into the epoxy coating, the adhesion of coating to steel substrate was improved significantly. Consequently, the adhesion of epoxy/3 wt. % modified HT/TA coating was increased 3 times as compared to epoxy neat (from 0.76 MPa to 2.77 MPa). In addition, the relative hardness and gloss retention of epoxy/3 wt. % modified HT/TA coating reached the maximum values as compared to the others. Owing to salt spraying results, the epoxy/3 wt. % modified HT/TA exhibited an excellent anticorrosion ability for the steel substrate. All the above results show the potential of HT nanoparticles loading TA modified with TMSPM as anticorrosive additives for protective coatings on steel substrates.
Dual nonionic photoacids synergistically enhanced photosensitivity for chemical amplified resists

Ling-Yan Peng,Shi-Li Xiang,Jun-Dan Huang,Ying-Yi Ren,Pan Hong,Chong Li,Jun Liu,Ming-Qiang Zhu

DOI: https://doi.org/10.1016/j.cej.2024.148810

IF: 15.1

2024-01-24

Chemical Engineering Journal

Abstract:In this paper, 4,5-dimethoxy-2-nitrobenzyl methacrylate (MONMA) was copolymerized with 2-hydroxyethyl methacrylate (HEMA) and tert -butyl methacrylate (TBMA) to obtain the terpolymer with dual sensitivity of ultraviolet (UV) light and acid, P(MONMA-HEMA-TBMA). The nonionic photosensitive ester, 4,5-dimethoxy-2-nitrobenzyl p -toluene sulfonate (MONS), is designed and synthesized as the prime photoacid generator (PAG) because of excellent photoacid generating capability of MONS and the similar substituted structure between MONS and MONMA. The ester groups in MONS PAG small molecules and the MONMA units of P(MONMA-HEMA-TBMA) disintegrate under UV irradiation to generate free diffused sulfonic acids and localized carboxylic acids , respectively. Both free and localized acids facilitate the subsequent acid-catalyzed hydrolysis of TBMA adjacent to MONMA units to induce exponential growth of carboxylic acids. Therefore, the hydrolyzed polymers containing high-content carboxylic acids become soluble in the alkaline developer. Hydrophilic HEMA is introduced to the photoresist resin to improve the interfacial affinity between the resist and the substrate. Dual synergy effect from free photoacid generator MONS and polymerized photoacid unit MONMA enhances photoacid generation and accelerates acid proliferation, which enables the decreased exposure dose and lower content of free photoacid generator MONS. A series of novel chemical amplification photoresists with various methacrylate monomer ratios are designed and synthesized to optimize the photolithographic effect of photoresist resin. The UV photolithography results demonstrate that the distinct exposed patterns are obtained at a low exposure dose using the photoresist formulation with P(MONMA 50 -HEMA 19 -TBMA 31 ) and MONS of 9:1 w/w.

engineering, chemical, environmental
Wet Chemical Etching of Lead Zirconate Titanate Thin Film for Microelectromechanical Systems Applications

YY Lin,Q Liu,TG Tang,X Yao,WN Huang

DOI: https://doi.org/10.1080/00150190108225175

2001-01-01

Ferroelectrics

Abstract:PbZr0.52Ti0.48O3 thin film prepared by metal-organic decomposition method was chemically etched by utilizing HF/HNO3 solution. Typical semiconductor processes were used to pattern the film. The dependence of the conformity of pattern transfer on the microstructure of the film was studied. The results showed that the etching rates were different between the islands of the grains and the surrounding areas within the film. The film with small grains is favored for pattern transfer of fidelity. The dimension of the islands of grains contributes greatly to the tolerance of patterned features. Tolerance of 2 mum has been achieved to fulfill the need of usage in microelectromechanical systems.
Reparation and Performance Testing of Free Radical Photocurable Passivation Film Modified by Titanate Coupling Agent for Hot-plated Aluminum-zinc Steel Plate

Weixing Lu,Linling Wu,Chunyu Ma,Jing Yuan,Qianfeng Zhang

DOI: https://doi.org/10.1007/s11595-022-2635-7

2022-12-01

Journal of Wuhan University of Technology-Mater. Sci. Ed.

Abstract:To study the effect of free radical photocurable passivation film modified by titanate coupling agent for hot-plated aluminum-zinc plate, trimethylpropane triacrylate (TMPTA) and 2-phenoxyethyl acrylate were used as active diluents, a mixture of modified epoxy acrylate and modified polyester acrylate in a certain proportion was used as an oligomer, 2-methyl-1-[4-(methylothyl) benzene] -2-morpholine acetone (907) was used as a free radical photoinitiator, isopropyl thioxanthone (ITX) was used as sensitizer, and bis (dioctyl phosphate acyl) titanate ethyltitanate acrylamide chelate (FD-812) was used as corrosion inhibitor modifier. After UV-curing, the passivation film was characterized by neutral salt spray test, electrochemical testing and other methods. The general performance of the passivation film may meet the requirements of downstream users of hot aluminum-zinc steel plate. The neutral salt spray test, electrochemical testing and microscopic surface morphology analysis of passivation film are in agreement. The introduction of titanate components may effectively promote the photocuring of free radicals. There have been few reports on the titanate coupling which is added to UV-curing coating formula. The titanate coupling agent contains acrylamide groups and terminal amine groups, acrylamide group has oligomer and crosslinking monomer, the terminal tertiary amine groups can provide hydrogen protons, reduce oxygen polymerization, and a phosphating film is formed on the surface of the metal substrate to improve the adhesion and corrosion resistance of the coating.

materials science, multidisciplinary
A Tunable Nanoimprint System to Create New Features

Xiang Zhang,Xin Hu,Lei Shen,Xinrui Chen,Haixiong Ge

DOI: https://doi.org/10.1002/mame.201800257

2018-01-01

Macromolecular Materials and Engineering

Abstract:Fabrication of different patterns based on the same nanoimprint mould is very attractive due to the time and cost consumption of fabricating hard mould. This paper demonstrates a tunable photo-curing nanoimprint system to create new features based on the same polydimethylsiloxane (PDMS) mould and a Ti-containing resist synthesized by titanium (IV) ethoxide and 2-(methacryloyloxy)ethyl acetoacetate. The resist exhibits very high oxygen RIE resistance and is able to take the place of traditional polysiloxance based resists to fabricate high-aspect-ratio patterns. The resist also has a low shrinkage (about 2.45%) and a high Young's modulus of 10.85GPa after photo-curing. High polarity contrast of PDMS and Ti-resist makes the release process freely and PDMS mould can be directly used without further anti-stick treatment. A number of new features are imprinted into Ti-resist based on the same PDMS mould by controlling the deformation and the stretched PDMS mould can be repeatedly used after relaxation.
Microscopic deprotection mechanisms and acid loss pathways of chemically amplified photoresists for deep/extreme ultraviolet photolithography

Hong Du,Zilin Wang,Hanshen Xin,Jie Xue,Jianhua Zhang,Haoyuan Li

DOI: https://doi.org/10.26434/chemrxiv-2024-bj8mk

2024-07-01

Abstract:Chemically amplified resists are an important type of material to realize precise microscopic patterning in deep and extreme ultraviolet photolithography. Currently, their development relies heavily on trial-and-error, while achieving higher sensitivity and resolution requires rational molecular design. This task can benefit from an in-depth comprehension of the acid-catalyzed deprotection mechanisms and acid loss pathways at the atomic level. However, our current understanding is largely empirical and the diverse types of photoresists and protective groups pose a significant challenge in fully revealing the microscopic mechanisms. In this study, density functional theory calculations are employed to investigate three primary types of deprotection reactions: tert-butyloxycarbonyl, ester, and ring-opening. Representative polymer photoresist units and fully/half-protected molecular glasses are considered as model systems. The calculations reveal multiple reaction pathways, each characterized by distinct energy barriers. In particular, the rate-determining steps are identified, and potential photoacid loss pathways are uncovered. These findings establish a comprehensive molecular understanding of the deprotection mechanisms of chemically amplified resists for advanced photolithography, providing valuable theoretical insights for their systematic design to achieve higher performances.

Chemistry

New metallization method of modified tannic acid photoresist pattern

A new metallization method of modified tannic acid photoresist patterning †

Highly Sensitive Cationic Photoresist for High-Throughput Two-Photon Nanofabrication

Controlled in-situ reduction strategy for synthesis of transparent conductive metal meshes using tannic acid-based photoresists

Tunable photo-patterning of organic color-centers

Metal Patterning Based on Femtosecond Laser Direct Writing (Invited)

Synthesis of acrylated tannic acid as bio-based adhesion promoter in UV-curable coating with improved corrosion resistance

Laccase-immobilized tannic acid-mediated surface modification of halloysite nanotubes for efficient bisphenol-A degradation

Evaluation of Nano-Patterning Performance of Water-Soluble Material for Photoresist Using Sugar Chain

An Oxygen-Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by Uv-Nanoimprint Lithography

Tannic Acid Selective Modulation Defects to Enhance the Photocatalytic CO2 Reduction Activity of Layered Double Hydroxides

Patterned anodic aluminium oxide fabricated with a Ta mask

Polyphenol‐Induced Adhesive Liquid Metal Inks for Substrate‐Independent Direct Pen Writing

Progress in Novel Surface Pretreatment and Studying Method of Organic Coated Metals

28nm Metal Hard Mask etch process development

Modification of Hydrotalcite Loading Tannic Acid with Organic Silane and Application in Anticorrosive Epoxy Coating

Dual nonionic photoacids synergistically enhanced photosensitivity for chemical amplified resists

Wet Chemical Etching of Lead Zirconate Titanate Thin Film for Microelectromechanical Systems Applications

Reparation and Performance Testing of Free Radical Photocurable Passivation Film Modified by Titanate Coupling Agent for Hot-plated Aluminum-zinc Steel Plate

A Tunable Nanoimprint System to Create New Features

Microscopic deprotection mechanisms and acid loss pathways of chemically amplified photoresists for deep/extreme ultraviolet photolithography