Patterned anodic aluminium oxide fabricated with a Ta mask

Xiaowei Zhao,Peng Jiang,Sishen Xie,Jiafeng Feng,Yan Gao,Jianxiong Wang,Dongfang Liu,Li Song,Lifeng Liu,Xinyuan Dou,Shudong Luo,Zengxing Zhang,Yanjuan Xiang,Weiya Zhou,Gang Wang
DOI: https://doi.org/10.1088/0957-4484/17/1/007
IF: 3.5
2006-01-01
Nanotechnology
Abstract:Electrochemical anodization was applied to an aluminium (Al) sheet patterned with a metallic tantalum (Ta) mask, which gave rise to the formation of patterned anodic aluminium oxide (AAO). The morphological evolution of the AAO porous structure with anodizing time was characterized by scanning electron microscopy. Lateral anodizing of the Al sheet gradually developed underneath the metallic Ta mask with the increase of anodizing time. This has given us further understanding of the Al anodizing behaviour compared with our previous work with a SiO2 masked Al sheet. By controlling the anodizing time and the size of the metal mask, deep lithography of the Al substrate can be realized, and a mushroom-like Ta-Al microstructure with a high aspect ratio was created on the Al surface after removal of the AAO film. This Ta-Al microstructure has been studied in detail, and it was found to exhibit pronounced hydrophobic properties.
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