Reversible and irreversible photon-absorption in amorphous SiO 2 revealed by deep potential

Yongnian Qi,Xiaoguang Guo,Ming Li,Chongkun Wang,Qing Mu,Ping Zhou
DOI: https://doi.org/10.1016/j.jnoncrysol.2023.122682
IF: 4.458
2023-10-15
Journal of Non-Crystalline Solids
Abstract:Understanding the kinetic balance between reversible and irreversible photon-absorption (IPA/RPA) in amorphous-SiO 2 (a-SiO 2 ) is crucial for mitigating optical damage and assessing the lifetime of irradiated optics. Experimental work has placed some thermodynamic bounds on the formation of defects from damage precursor, but the formation kinetics and underlying microscopic mechanisms are yet to be elucidated. Here, by employing deep neural network potential, we find that the formation of defects are temperature-dependent and density-dependent, where competitions between IPA and RPA take place. The IPA prevails in the early formation of E'-center, and the ratio of IPA/RPA is related to the strained bonds, SiSi bonds and 5-coordinated silicon (Si 5 ). Furthermore, the Si 5 is critical to the propagation of E'-center and densification of a-SiO 2 . Additionally, we develop quantitative models of defects in regard with irradiation temperature of specified temperature and irradiation photon-energy, respectively.
materials science, multidisciplinary, ceramics
What problem does this paper attempt to address?