Overcoming oxygen inhibition in UV photolithography for the fabrication of low-loss polymer waveguides

Xingyu Xu,Xiao Lu,Fufei Pang,Na Chen,Heming Wei,Liang Zhang,Qianwu Zhang,Tingyun Wang
DOI: https://doi.org/10.1364/ol.522970
IF: 3.6
2024-04-25
Optics Letters
Abstract:Xingyu Xu, Xiao Lu, Fufei Pang, Na Chen, Heming Wei, Liang Zhang, Qianwu Zhang, Tingyun Wang Perfluorinated acrylate polymer materials exhibit low absorption loss at 1310 and 1550?nm, but molecular oxygen inhibits their photocuring. ... [Opt. Lett. 49, 2369-2372 (2024)]
optics
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