Improving Circuit Design for the Stability of Inverters Based on Amorphous Indium Gallium Zinc Oxide Thin Film Transistors

Shu Jiang,Tianhao Zhang,Xiaomin Wei,Liangdong Li,Chengyuan Dong
DOI: https://doi.org/10.37188/cjlcd.2024-0177
2024-01-01
Chinese Journal of Liquid Crystals and Displays
Abstract:The stability of thin film transistor inverters affects their further applications in the fields such as system on glass (SOG ), etc. . In this study, , a simulation model of amorphous IGZO TFT devices was extracted based on the experimental data. In addition, , the stretched-exponential equation between the threshold voltage change (Delta V (TH) ) and the bias stress time was obtained by fitting. Then, , the variation of the electrical stability of traditional pseudo-CMOS inverters with bias stress time was explored, , and an improved TFT inverter circuit was proposed, , followed by the channel width adjustment and layout design. The revised inverter improves the high output voltage by 18. 47% by delaying the pull-down transistor in the output stage. Meanwhile, , the proposed inverter alleviates the effect of equivalent resistance increase caused by the threshold voltage shift on the output stage current through feedback, , significantly improving its speed stability. When the bias stress time is 2. 56>< 10(7) s, , the variation rate in its rise time is only 4. 09%, , far lower than the 296. 11% of the traditional pseudo-CMOS inverters.
What problem does this paper attempt to address?