Investigation of Sheet Width Dependence on Hot Carrier Degradation in GAA Nanosheet Transistors

Zixuan Sun,Zirui Wang,Runsheng Wang,Ru Huang
DOI: https://doi.org/10.1109/snw63608.2024.10639242
2024-01-01
Abstract:In this paper, we investigate the sheet width (SW) dependence of hot carrier degradation (HCD) in gate-all-around (GAA) nanosheet. We observe that HCD intensifies with an increase in SW, displaying a more pronounced width dependency in nGAA compared to pGAA. The analysis indicates that the worsening of HCD can be attributed to an increase in carrier energy due to more severe self-heating effect (SHE), which are caused by the increased current driven by wider sheets. It is elucidated that the width dependency of HCD is less pronounced in pGAA devices because they have lower mobility and higher threshold voltages, leading to a weaker dependence of their thermal power on SW. Consequently, under the same HCD stress, the increase in SW has a lesser impact on self-heating in pGAA than in nGAA, resulting in a weaker SW dependence of HCD in pGAA devices.
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