Effect of TiN Capping Layer on Barrier Inhomogeneities for TiSix/Si Schottky Diode

Wu Peng,Lin-Lin Wang,Yu-Long Jiang
DOI: https://doi.org/10.1109/icsict.2014.7021176
2014-01-01
Abstract:The effect of TiN capping layer on barrier inhomogeneities for TiSix/n-Si Schottky diode is studied by temperature dependent current-voltage (I-V-T) measurements in this paper. The I-V-T curves from 90K to 310K show that the homogeneity of TiSix/n-Si Schottky diode can be obviously influenced by TiN capping layer. A double Gaussian model is employed to characterize the Schottky barrier distribution inhomogenities. It is revealed that the TiN capping layer can degrade the Schottky barrier distribution homogeneity and lower the apparent barrier height of the whole diode.
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