Improving 2D Schottky Contacts Using an Intralayer Strategy

Zuoping Zhou,Guangqi Zhang,Junjie Yao,Liang,Yuheng Li,Zhongyuan Zhao,Zhen Mei,G. D. Gu,Yong Xu,Shoushan Fan,Qunqing Li,Xi Chen,Yang Wei
DOI: https://doi.org/10.1016/j.device.2024.100434
2024-01-01
Device
Abstract:2D materials are promising building blocks for future electronics. The performance of 2D electronic devices highly depends on the metal-semiconductor (M-S) contacts. Devices whose functions are featured by the barriers of M-S contacts are called Schottky devices and are extensively used in electronics and optoelectronics. Here, we suggest that the use of the 2D Bi2S2CaCu2O8+delta (BSCCO) as a contact on a 2D semiconductor could improve the Schottky contacts and develop new 2D Schottky devices. Thanks to the intralayer structure of the 2D BSCCO and the van der Waals stacking, the interfacial coupling at the 2D M-S contact can be significantly suppressed, resulting in improved electrical properties of Schottky devices such as high rectification ratios of Schottky diodes and low subthreshold swing values of transistors with Schottky gates. This method introduces an intralayer strategy to build prospective 2D Schottky devices.
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