Two-dimensional Perovskite Oxide High-Κ Dielectric for High-Performance Phototransistors

Zhongfan Liu
DOI: https://doi.org/10.1016/j.scib.2024.05.005
IF: 18.9
2024-01-01
Science Bulletin
Abstract:Field-effect transistors are essential components of modern electronics.Nowadays,the continued scaling of electronic and optoelectronic devices is bringing silicon-based technologies close to their physical limits,causing issues such as short-channel effects[1].Two-dimensional(2D)semiconductors provide an attractive solution for transistors to extend Moore's law because of their ultrathin thickness and immunity to short-channel effects[2].To fulfill the potential of 2D semiconductors,gate dielectrics need to be simultaneously engineered to build future 2D-material-based transistors.Gate insulators with high dielectric constants(κ)exhi-bit lower equivalent oxide thickness,which can ensure efficient gate control over channels and low gate leakage[3].Therefore,tremendous efforts have been made in searching for novel high-K dielectrics.
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