Abstract:Silicon has been the dominant semiconductor for the microelectronics industry since the late 1950s. Following Moore's law, silicon-based integrated circuit (IC) technology evolved into a 5 nm node by the end of 2020. However, silicon-based electronics face various challenges such as reduced carrier mobility and increased short-channel effects at sub-10 nm nodes. To overcome these drawbacks, two-dimensional (2D) semiconductors are among the most competitive candidate materials for next-generation electronics, due to their intrinsic atomic thickness, flexibility, and dangling-bond-free surfaces. Among all the 2D semiconductors, an air-stable and high-mobility 2D Bi2O2Se semiconductor, a novel ternary material, has some prominent advantages that make it particularly favorable in the electronics industry. First, it demonstrates ultrahigh carrier mobility, moderate band gap, outstanding stability, and excellent mechanical properties. Second, it can react with oxygen plasma or oxygen at elevated temperatures to form a high-kappa native oxide Bi2SeO5. The native oxide Bi2SeO5 forms an atomically sharp interface with Bi2O2Se and can directly serve as a gate dielectric. Bi2O2Se is also embodied with some interesting physical properties such as strong spin-orbit coupling, dimerized selenium vacancies, and ferroelectricity. Taking advantage of these properties, researchers have fabricated high-performance electronic devices, including logic devices, optoelectronics, thermoelectrics, sensors, and memory devices. In this account, we will systematically review the structure of 2D Bi2O2Se, including its crystal structure, surface structure, point defects, and electronic band structure and how these structures can affect the electron transport in 2D Bi2O2Se. We will then discuss different approaches to synthesize this material including chemical vapor deposition (CVD), metal-organic chemical vapor deposition (MOCVD), molecular beam epitaxy (MBE), and the solution-assisted method. All these methods show great potential in large-scale production. Third, we will discuss how the structure of Bi2O2 Se affects its chemical and physical properties such as chemical reactivity and ferroelectric, piezoelectric, and electromechanical properties. Fourth, we will talk about how to make use of these properties in electronic devices, including field-effect transistors, logic gates, bolometers, photodetectors, thermoelectrics, piezoelectrics, sensors, and memory devices. Finally, we will put forward our idea on how to pattern large-area Bi2O2Se thin films into isolated channel regions and integrate these devices together into full-functioning circuits. We believe that 2D Bi2O2Se is a promising semiconductor, as a great diversity of high-performance 2D Bi2O2Se-based devices have demonstrated. Hopefully, the unique characteristics of 2D Bi2O2Se can provide additional opportunities to complement or replace silicon as the material platform of the next-generation electronics industry. To fill the gap between dreams and reality, there is still much work to be done, especially in large-scale material synthesis and systematic device integration.

A native oxide high-kappa gate dielectric for two-dimensional electronics

A native oxide high-κ gate dielectric for two-dimensional electronics

A Single-Crystalline Native Dielectric for Two-Dimensional Semiconductors with an Equivalent Oxide Thickness below 0.5 Nm

Uniform High-k Amorphous Native Oxide Synthesized by Oxygen Plasma for Top-Gated Transistors

Two-dimensional Bi2SeO2 and Its Native Insulators for Next-Generation Nanoelectronics

Vertically grown ultrathin Bi 2 SiO 5 as high- κ single-crystalline gate dielectric

Native O and Se Vacancy Defects in Bi2O5Se, Bi2O9Se3, and Bi2O10Se3 Dielectrics for Nanoelectronics

Producing ultrathin monocrystalline native oxide dielectrics for 2D transistors

A Single‐Crystal Antimony Trioxide Dielectric for 2D Field‐Effect Transistors

Single-crystalline van der Waals layered dielectric with high dielectric constant

Epitaxial Integration of Transferable High-κ Dielectric and 2D Semiconductor

2D Bi2O2Se: an Emerging Material Platform for the Next-Generation Electronic Industry

Uniform and ultrathin high-κ gate dielectrics for two-dimensional electronic devices

Low Residual Carrier Concentration and High Mobility in 2D Semiconducting Bi2O2Se

Scalable Integration of Hybrid High-Κ Dielectric Materials on Two-Dimensional Semiconductors

High-performance Sub-10 Nm Monolayer Bi2O2Se Transistors

Single-crystalline metal-oxide dielectrics for top-gate 2D transistors

High- κ monocrystalline dielectrics for low-power two-dimensional electronics

Single-crystalline metal oxides as dielectrics for top-gate two-dimensional transistors

Two-dimensional Perovskite Oxide High-Κ Dielectric for High-Performance Phototransistors

HfSe2 and ZrSe2: Two-dimensional semiconductors with native high-κ oxides