A Logic-Process Compatible RRAM with 15.43 Mb/mm<sup>2</sup> Density and 10years@150°C retention using STI-less Dynamic-Gate and Self-Passivation Sidewall

Qishen Wang,Yuhang Yang,Zongwei Wang,Shengyu Bao,Jingwei Sun,Linbo Shan,Lin Bao,Yi Gao,Haisu Zhang,Yaotian Ling,Wuzhi Zhang,Yansheng Wang,Yimao Cai,Ru Huang
DOI: https://doi.org/10.1109/IEDM45741.2023.10413885
2023-01-01
Abstract:We have successfully demonstrated, for the first time, the STI-less dynamic-gate (DG) technique with self-passivation sidewall (SPS) enhanced RRAM cells on a commercial 40nm CMOS production platform. This achievement resulted in a record-density of 15.43 Mb/mm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> and a high retention of 10years@150°C. Through a comprehensive design-technology co-optimization (DTCO) process, we obtain significant improvements in various key characteristics, as evidenced by experimental results at both the wafer (12-inch) and chip (4K&1M) level. These improvements include improved memory window (>20μA), enhanced uniformity, extended retention (10years@150°C), and multilevel cell (MLC>3bit). This work indicates the potential of RRAM as embedded non-volatile memory (eNVM) in advanced technology node for consumer and industrial applications.
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