Abstract:The surface preparation is a prerequisite for ensuring the required properties of a diamond film formed by gas-phase deposition. The influence of the temperature and concentration of the CuSO 4 etchant on the structural and phase compositions of the surface of hard-alloy materials is considered in this work, and the structural and phase compositions of a continuous polycrystalline diamond film at its growth stages is also considered. The adhesion of the diamond films to the surface of hard-alloy materials is determined qualitatively. It is established that the treatment of the hard-alloy surface in the CuSO 4 solution at t = 23°C leads to the inhomogeneous removal of a cobalt binder with chipping WC grains and the formation of the porous structure in the surface layer of the WC–6% Co alloy. The treatment by the CuSO 4 etchant at t = –2°C provides the homogeneous etching of the Co binder over the boundaries of WC grains and the formation of a chemically homogeneous surface. The orientation growth and adhesion of the diamond film depend on the elemental composition of the WC–Co alloy surface after treatment by the CuSO 4 solution. If the treatment was performed at t sln = 23°C, then the removal of copper from the defect surface WC layer is complicated during the synthesis, which provides the multidirectional growth of diamond crystals in the film along two directions, 〈111〉 and 〈110〉, which causes critical biaxial compressive stresses (2.5 GPa) and leads to low film adhesion to the hard alloy surface. If the treatment is performed at t sln = –2°C, then the orientational growth of diamond crystals in the film occurs in one preferential crystallographic direction 〈111〉, which lowers the biaxial compressive stresses (1.7 GPa) and increases the adhesive bond of the film to the hard alloy surface. The structure imperfection calculated from the ratio of the lines of integrated intensities I 1333 / I 1580 using the Raman spectroscopy method decreases with an increase in concentration at negative temperatures and increases at positive temperatures of the CuSO 4 solution during surface preparation.

Structure and Characteristics of Si-coated Diamond Grits

Growth of Diamond Films on Si3n4 Coated Silicon Substrates

Bonding performance of diamond grit to a Co-Si alloy

Amorphous SiO2 Interlayers for Deposition of Adherent Diamond Films Onto WC–Co Inserts

Diamond Deposition on WC–Co Substrate with Amorphous SiC Interlayer

Si-doped Diamond Films Prepared by Chemical Vapour Deposition

Effect of Si/O Doping on the Thermal Stability of Non-Bonded Hydrogenated Diamondlike Carbon Coatings

Effect of Silicon Doping in Cvd Diamond Films from Microcrystalline to Nanocrystalline on Wc-Co Substrates

Consecutive Deposition of Amorphous SiO2 Interlayer and Diamond Film on Graphite by Chemical Vapor Deposition

Reprint of “A Study of CVD Diamond Deposition on Cemented Carbide Ball-End Milling Tools with High Cobalt Content Using Amorphous Ceramic Interlayers”

Sintering and Toughening Behavior of Dense SiC-coated Diamond Dispersed WC/Co Composites(Materials, Metallurgy & Weldability)

Synthesis and comprehensive synchrotron-based structural analysis of Si-doped nanodiamond composite films deposited on cemented carbide

SiC Interlayer/diamond Coatings Prepared on Cemented Carbide Micro-Tools by High Current DC Extended Arc Chemical Vapor Deposition

Tribological properties and cutting performance of boron and silicon doped diamond films on Co-cemented tungsten carbide inserts

Preparation of Ti-coated Diamond Particles by Microwave Heating

Tribological and Cutting Behavior of Silicon Nitride Tools Coated with Monolayer- and Multilayer-Microcrystalline Hfcvd Diamond Films

Growth Features of Diamond Films on the Tungsten Carbide Surface with a Copper Sublayer

Friction and Cutting Properties of Hot-Filament Chemical Vapor Deposition Micro- and Fine-Grained Diamond Coated Silicon Nitride Inserts

Effects of silicon doping on low-friction and high-hardness diamond-like carbon coating via filtered cathodic vacuum arc deposition

Effect of Nitrogen Doping on the Microstructure and Thermal Stability of Diamond-Like Carbon Coatings Containing Silicon and Oxygen

Deposition and Characterization of Nanocrystalline Diamond Films on Co-cemented Tungsten Carbide Inserts