Research on Magnetic Levitation Precision Stage with CAD/CAE/CAT

Y F Wang,Wang Song,Hantao He,Xi Tian,Xiaobao Yang,Zhanyong Lu
2003-01-01
Abstract:A new type of magnetic levitation stage which can locate a wafer with Nanometer positioning accuracy is designed by means of CAD/CAE/CAT technology. The stage is suspended on the X&Y rails which be made of granite and SiC by applying magnetic levitation technology. There are no friction and wearing to the rails. The stage is driven speedily and positioned coarsely by linear motors with non-contact driving, When controlling and adjusting the current of electromagnetic coils, fine positioning, field-by-field leveling and focusing to the stage can be implemented. By using CAD/CAM/CAE software UG17, solid models of the magnetic levitation X-Y stage were built and the mechanism simulation was done. Electromagnetic field analysis is made by using finite element method(FEM) in ANSYS/Multiphysics and ANSYS/Emag programs. Typical quantities of interest in a magnetic analysis are available such as Magnetic flux density, Magnetic field intensity, Magnetic forces, Power loss and Flux leakage in the system of magnetic levitation. On the basis of electromagnetic field analysis, X-Y stage structure static analysis and dynamics analysis will be done for improving design to meet the demand of positioning precision and speed. By means of computer Aided Test (CAT)technology, magnetic levitation control and modal test are conducted to prove finite element analysis results are correct and get accurate parameter for design and control CAD/CAE/CAT technology plays an important role in the stage design to meet 0.02 mum positioning accuracy in X axis and Y axis, This stage will be applied in the new generation of Laser photolithography equipment with critical dimension 0.18 mum.
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