Preparation and Properties of Nanoporous Polyimide Films with Low Dielectric Permittivity

Zhi‐Min Dang
2011-01-01
Journal of Functional Biomaterials
Abstract:SiO2/polyimide(PI) nanocomposite films with low dielectric permittivity with diamines of pyromellitic dianhydride(PMDA) and 4,4-oxydianiline(ODA) were successfully synthesized by a wet phase inversion process.Then removal of the silica cores of the nano-composite films by HF etching gives rise to the nanoporous of PI films.It is found that the dielectric permittivities of the porous films can be reduced from 3.54 of the pure PI to 3.05(1kHz) by using 15 wt% pore-former(SiO2).The nanopores were characterized by transmission electron microscopy(TEM).The relationships between the structure of the films and the properties,including the dielectric permittivity,the heat resistance,the contact angles and the mechanical strength,were researched.
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