AN EFFECTIVE-SUBSTRATE METHOD TO INVESTIGATE AN IRON NATIVE OXIDE LAYER ON AN IRON SUBSTRATE BY SPECTROSCOPIC ELLIPSOMETRY

Shang Gao,Jie Lian,Zhen Sun,Xiao Wang,Ping Li,Qinghao Li

DOI: https://doi.org/10.1142/s0217984913500449

2013-01-01

Modern Physics Letters B

Abstract:An effective-substrate method was presented to obtain the optical constants of an iron native oxide layer with unknown optical constants and film thickness on an iron substrate with unknown optical constants by using spectroscopic ellipsometry (SE). "Thick" iron films were deposited on silicon wafer by magnetron sputtering and were exposed to air at room temperature. They were measured by spectroscopic ellipsometry during this procedure at different time points from ten minutes to seven months. Pseudo optical constants were calculated from the initially measured data and were introduced into the modeling work of subsequent measurements as an effective substrate in order to obtain the optical constants and film thickness of the native oxide layer. After obtaining the optical constants of the subsequent native oxide layer, they were employed in the modeling work of the initially measured data and the optical constants of the iron substrate and the film thickness of the initial native oxide layer was obtained.