Measurement of Stress-Optic Coefficients for Metals in the Visible to Near-Infrared Spectrum with Spectroscopic Ellipsometry
Xin Sun,Shibin Wang,Linan Li,Zongze Huo,Lei Wang,Chuanwei Li,Zhiyong Wang
DOI: https://doi.org/10.1016/j.optlaseng.2022.107362
2022-01-01
Abstract:The measurement of stress-optic coefficients is of great importance in photoelasticity which can be used in many fields, such as stress measuring and nondestructive testing. In this paper, the stress-optic coefficients of Cu film were measured in the visible to near-infrared spectral range by spectroscopic ellipsometry. In order to determine the stress-optic coefficients, a measuring principle is proposed by the combination of the classic 4 x 4 Matrix method of ellipsometry and the stress-optic law. According to this principle, we establish a quantitative relation between the ellipsometric parameters ( P, A) and stress, which is related to stress-optic coefficients. The ellip-sometric parameters of a thin film/substrate assembly by sputtering Cu on polyimide (PI) were experimentally measured under various stress conditions. Fitting the proposed measuring principle to experimental data, the stress-optic coefficients of Cu film in the visible to near-infrared spectral range were obtained. This research pro-vides insights into stress measuring of metal films, which is widely needed in many application fields such as chip processing.