Solid Potentiometric ${\rm CO}_{2}$ Sensor Using ${\rm Li}_{3}{\rm PO}_{4}$ Film as the Electrolyte

Hairong Wang,Junqiang Ren,Huan Zhang,Guoliang Sun,Zhuangde Jiang
DOI: https://doi.org/10.1109/jsen.2011.2182041
IF: 4.3
2012-01-01
IEEE Sensors Journal
Abstract:A solid potentiometric CO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> sensor has been developed using Li <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> PO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</sub> as the electrolyte, Li <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> TiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> /TiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> as the reference electrode, and Li <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> CO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> as the sensing electrode. The Li <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> PO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</sub> film was deposited on Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> substrate by resistance heating evaporation. Two Pt electrodes with designed patterns were formed on the electrolyte film by micro fabrication technologies. The reference electrode and the sensing electrode were prepared by thick-film technology to cover part of the two Pt electrodes. Various properties were tested: sensitivity under different conditions, response and recovery properties, cross-interference performance, and stability. The values of ΔEMF/dec are 22 mV/dec, 45 mV/dec, and 78 mV/dec in accordance with the operating temperatures: 300°C, 400°C, and 500°C. At 500°C, the response time and recovery time are 30 s and 40 s, respectively, which is better than those of 400°C. When the thickness of Li <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> PO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</sub> film is greater than 650 nm, the EMF output of the sensor changes little with change of the film thickness. From the results, it can be concluded that the optimal working temperature for the sensor is 500°C, and the optimal thickness of Li <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> PO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</sub> is about 650 nm.
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