Si1−<i>x</i>Ge<i>x</i>/Si asymmetric 2×2 electro-optical switch of total internal reflection type

Yong Gao,Xiding Liu,Guozheng Li,Enke Liu,Xiangjiu Zhang,Xuekun Lu,Jihuang Hu,Xun Wang
DOI: https://doi.org/10.1063/1.114899
IF: 4
1995-01-01
Applied Physics Letters
Abstract:Based on plasma dispersion of Si1−xGex, we have fabricated asymmetric 2×2 switches of total internal reflection type, in which Si1−xGex was grown by molecular beam epitaxy. The optimum intersecting angle is 4°, and the crosstalk is less than −10.6 dB at 76 mA injection current. The insertion loss is 2.8 dB, and the switch time is 0.6 μs.
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