Abstract:Surface etching of single-crystal diamond (SCD) in hydrogen plasma plays a decisive role for high-quality homoepitaxy and surface conduction of diamond. The complexity of surface/subsurface condition such as defects would give rise to the distinct morphology features and even further result in the unpredictable properties. Correspondingly, the evolutionary relationship between the morphology and electrical properties of mechanically polished SCDs which have typical cleavage damage in microns depth after hydrogen plasma treatment still needs to be further completed. In this work, the chemical vapor deposited (CVD) SCDs with uniform polishing-caused subsurface cleavage were immersed in microwave hydrogen plasma for variable duration. Time-dependent morphological evolution, multi-mode etched pits (EPs) (resulting from local defects/cracks and dislocations) and associated etching mechanism were comprehensively studied. At the early stage of plasma treatment before 60 min, owing to the obvious surface roughing generated by preferential etching (with the rate of >400 nm/h) of severe mechanically damaged regions, the hole mobility was significantly deteriorated, also accompanying with the apparent drop of sheet concentration. Concurrently, the deposited surface sp2 amorphous carbon (a-C) nanodots on diamond surface and non-sp3 hydrogen bonds reconstruction, which arising from defect-etching produced local abundant carbon-containing radicals or possible exfoliation generated by hydrogen penetration of massive defective regions, also would play an adverse role for the conduction associated with (100) C–H surface. However, the surface roughness was reduced from the maximum 13.2 nm–4.2 nm by prolonging etching, resulting from the smoothing effect of small-angle crystal misorientation on waved height difference related to the uniform (111) cleavage and the removal of dense irregular EPs associated with polishing-induced local defects as well as the vanishing of surface a-C nanodots. In this case, the improvement of surface electrical properties together with the negative correlation of the mobility and sheet concentration were appeared by the gradual formation of (100) diamond surface and the building of uniform (100) C–H bonds.

The Etching Mechanisms of Diamond, Graphite, and Amorphous Carbon by Hydrogen Plasma: A Reactive Molecular Dynamics Study

Precise Characterization of Atomic-Scale Corrosion of Single Crystal Diamond in H2 Plasma Based on MEMS/NEMS

Diamond Films and Particles Growth in Hydrogen Microwave Plasma with Graphite Solid Precursor: Optical Emission Spectroscopy Study

Atomic Scale Etching of Diamond: Insights from Molecular Dynamics Simulations

Microwave Plasma-Assisted Chemical Vapor Deposition of Microcrystalline Diamond Films Via Graphite Etching under Different Hydrogen Flow Rates

Molecular Understanding of the Effect of Hydrogen on Graphene Growth by Plasma-Enhanced Chemical Vapor Deposition

Deposition of Microcrystalline Diamond Films in H2 Microwave Plasma with Graphite Powder As Hydrocarbon Precursor

Surface etching evolution of mechanically polished single crystal diamond with subsurface cleavage in microwave hydrogen plasma: Topography, state and electrical properties

Effects of plasma etching treatment on the adhesion of diamond films

Molecular dynamics simulations of the growth of thin amorphous hydrogenated carbon films on diamond surface

Diamond Micropowder Synthesis Via Graphite Etching in a Microwave Hydrogen Plasma

Effect of Hydrogen Etching on the Electrical Prosperities of Nanocrystalline Diamond Film

Spectroscopic Study on the Evolution of Graphite Ablation Plume in ECR Argon Plasma During the Deposition of Diamond-Like Carbon Films

Optimizing hydrogen plasma etching process of preferred (110)-textured diamond film

Molecular Dynamics Simulation of the Deposition Process of Hydrogenated Diamond-Like Carbon (DLC) Films

Etching Characteristic of Graphite and Metal Substrates by Hydrocarbon Plasma in Closed Cavity

Insitu Observations Of Optical-Emission Spectra In The Diamond Deposition Environment Of Arc-Discharge Plasma Chemical Vapor-Deposition

Plasma-Induced Transformation of Carbon Nanotubes to Nanocrystalline Diamond

Research of the Growth and Nucleation Mechanisms of Diamond Film by Optical Emission Spectra and Raman Spectra

Diamond growth on Fe-Cr-Al alloy by H2-plasma enhanced graphite etching

Mechanistic Insights into the Formation of Dislocation-Related Pits on Diamond Surface under Plasma Etching Treatment: A Combined Simulation and Experimental Approach