Memory Window Ratio Enhancement of P-Type WSe2 Memtransistors Using Dielectric GeSe2 Nanosheets with Asymmetric Interfaces for Neuromorphic Computing

Mengna Wang,Yingjie Lv,Shasha Li,Jiarong Zhao,Dingwen Cao,Gaoli Luo,Yurong Jiang,Xiaohui Song,Yong Yan,Congxin Xia
DOI: https://doi.org/10.1021/acsanm.3c02435
IF: 6.14
2023-01-01
ACS Applied Nano Materials
Abstract:Theemergence of 2D wide-bandgap semiconductor (WBGS) GeSe2 as charge-trapping dielectrics has helped realize superiordevices by using an extremely simple device setup. However, the controllabilityof deep-gap-state defects in 2D GeSe2 poses a challengedue to the vulnerability and susceptibility of charge-trapping centers,resulting in various problems, i.e., small memory window and poordevice durability during programming. Herein, we deliberately performasymmetric interfacial oxidation to reinforce the memory performancebased on the WSe2/Janus-GeSe2 van der Waalsheterostructure, which exhibits a giant memory window ratio of 88.5%(70.8 V at & PLUSMN;40 V gate sweep range), high-room-temperature holemobility of 15 cm(2) V-1 s(-1), and low nonlinearity factor close to 0 with regard to synapticweight update characteristics. The information storage performanceis excellent, owing to the interface rendered by asymmetric oxidationin the GeSe2 layer, providing an effective charge-trappinglayer and atomically flat surface to enhance the mobility of the WSe2 channel. The controllable strategy helps to derive a simpledesign principle to realize high-performance 2D WBGS GeSe2-based memory and electrical synaptic devices with complex neuralfunctions.
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