Reconfigurable Dielectric Engineered WSe 2 /HZO Mem-transistor

Tong Tong,Yongli He,Yuan Gao,Yukang Liu,Kan Liao,Weisheng Li
DOI: https://doi.org/10.1088/2053-1583/ad70c9
IF: 6.861
2024-08-21
2D Materials
Abstract:Hybrid systems coupling 2D semiconductors with functional ferroelectrics are attracting increasing attention due to their excellent electronic/optoelectronic properties and new functionalities through the multiple heterointerface interaction. In our device architecture, interfacial states are introduced on the ferroelectric Hf 0.5 Zr 0.5 O 2 thin film as gate dielectric layer for charge trapping effect. Utilizing the collaborative effects of charge trapping and ferroelectric polarization behavior, a multifunctional 2D WSe 2 /HZO memtransistor is demonstrated with ultra-low off-state (dark) current of 10 -13 A, high on/off ratio of 10 6 and linear conductance update. This device exhibits reliable memory properties and tunable synaptic functions including short-term plasticity (STP)/ long-term plasticity (LTP), paired pulse facilitation (PPF), spike-timing dependent plasticity (STDP), synaptic potentiation/depression, and filtering in a single device. Extensive endurance tests ensure robust stability (1000 switching cycles, 2000 s holding time) and the synaptic weight update in the device exhibits excellent linearity. Based on the experimental data, our devices eventually achieve an accuracy of 94.8% in artificial neural network simulations. These results highlight a new approach for constructing hybrid systems coupling 2D semiconductors with functional ferroelectrics in a single device for tuning synaptic weight, optimizing circuit design, and building artificial neuromorphic computing systems.
materials science, multidisciplinary
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