Polarization-field tuning and stable performance of the resistance switching in a ferroelectric/amorphous PbZr 0.2 Ti 0.8 O 3 /La 2 Zr 2 O 7 heterostructure

Y. S. Yuan,Z. L. Lv,J. P. Cao,K. K. Meng,G. L. Zhao,K. Lin,Q. Li,X. Chen,Q. H. Li,X. H. Li,Y. L. Cao,J. X. Deng,X. R. Xing,Jun Miao
DOI: https://doi.org/10.1007/s10854-023-10800-4
2023-01-01
Abstract:PbZr 0.2 Ti 0.8 O 3 /La 2 Zr 2 O 7 (PZT/LZO) bilayer and amorphous La 2 Zr 2 O 7 thin films were fabricated using pulse laser deposition and radio frequency magnetron sputtering. A typical and robust bipolar resistive switching (RS) behavior was revealed in the PZT/LZO heterostructure at room temperature. Compared with LZO single film, the PZT/LZO heterostructure exhibits a better RS property with a one order magnitude higher HRS/LRS ratio. More interestingly, the RS of PZT/LZO structure exhibited a stable degradation RS performance until 10 3 cycles at room temperature. The conduction mechanism in PZT/LZO bilayer can be attributed to the space-limited-conduction (SCLC) and Schottky-barrier models, while LZO thin film was attributed to SCLC conduction. As a result, the PZT/LZO bilayer under polarization field tuning shows an effective way to improve the RS performance and provides a new route for RRAM applications.
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