Tunable Volatile to Non‐Volatile Resistive Switching in PbZrO3 Antiferroelectric Thin Film for Neuromorphic Computing

Zonglin Lv,Hongwei Wang,Jinpeng Cao,Chao Zhang,Gaolei Zhao,Richeng Yu,Bo Zhang,Xiaoguang Xu,Yong Jiang,Jun Miao
DOI: https://doi.org/10.1002/admi.202201005
IF: 5.4
2022-01-01
Advanced Materials Interfaces
Abstract:A direct coupling of antiferroelectric (AFE) and resistive switching (RS) is realized for the first time in an oxide heterostructures (non-tunneling mechanisms). This allows the resistance of the heterostructure to switch between volatile and non-volatile RS behavior, which indicates a threshold RS and broadly increases its practical applicability. The stacks of Pt/PbZrO3 (PZO)/LaNiO3/SrTiO3 (STO) is fabricated by laser pulse deposition. It exhibits a tunable RS behavior from volatile to nonvolatile through adjusting voltage amplitude. Moreover, a high ON/OFF ratio, good retention, and endurance characteristics are achieved. Furthermore, synaptic behaviors related to neural learning functions in PZO film is explored, that is, long-term potential/depression, spike timing dependent plasticity, and paired pulse facilitation. This work provides a way to engineer AFE and RS pertinent functionality for the low-energy-consumption, non-volatile neural computing.
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