Feasibility of applying microsecond-pulse glow discharge time of flight mass spectrometry in surface depth analysis

Yongxuan Su,Pengyuan Yang,Zhen Zhou,Xiaoru Wang,Fumin Li,Benli Huang,Jianshi Ren,Ming Chen,Hongbo Ma,Gongshu Zhang
DOI: https://doi.org/10.1016/S0584-8547(98)00143-8
1998-01-01
Abstract:This work evaluates the possibilities of applying microsecond-pulse glow discharge time of flight mass spectrometry (μs-pulse GD-TOFMS) in surface depth analysis. Investigations have been done for effects of discharge pressure on sputtered depth profiles as well as on topographies under μs-pulse GD mode; and also for influences of discharge current and discharge frequency on characteristics of sputtered surface. Sputtering rates of several pure metals under μs-pulse GD and dc-GD modes were studied and compared. The estimated erosion rates are 1.27, 2.90 and 5.18nms−1 for pure Fe, Cu and Zn layer, respectively. Depth profiling were conducted for a technical Zn–Fe layer (about 10μm) and for a Fe–Cu layer (about 1μm) by μs-pulse GD. A simple model was developed and utilized to convert ion intensity into element concentration, and the experimental results were presented and discussed. Preliminary results show that μs-pulse GD-TOFMS has a promising future in the area of surface depth analysis, especially in the depth analysis of thin layers and of their cross-sections.
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