Experimental Investigation of a Novel Junction-Modulated Hetero-Layer Tunnel FET with the Striped Gate for Low Power Applications.

Zhongxin Liang,Yang Zhao,Kaifeng Wang,Jieyin Zhang,Jianjun Zhang,Ming Li,Ru Huang,Qianqian Huang
DOI: https://doi.org/10.1007/s11432-022-3500-6
2023-01-01
Science China Information Sciences
Abstract:Silicon-based tunneling field effect transistor(TFET)with a band-to-band tunneling mechanism has been widely stud-ied due to its ultra-steep subthreshold swing(SS),ultra-low leakage current(Ioff),and good complementary metal-oxide-semiconductor process compatibility[1].However,the operation of silicon-based TFET faces two major challenges.On the one hand,the large indirect band gap of silicon re-duces the tunneling probability,and thereby the on-state current(Ion)[2].On the other hand,it is difficult to exper-imentally form abrupt source tunneling junctions[3],and the average SS(SSavg)of experimental TFETs is relatively large[4].
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