Abstract:The performance of diamond-coated cemented carbide tools manufactured via the conventional hot filament chemical vapor deposition (HFCVD) technique exhibits certain limitations, including issues with poor toughness and reduced adhesive strength of film-substrate systems, primarily attributed to the cobalt diffusion at elevated temperatures (> 800 °C). In this study, a pioneering exploration of a low-temperature diamond film deposition technique on cemented carbide is developed, and a comprehensive evaluation of the film properties is conducted. The results indicate that owing to constraints related to growth rate and diamond film purity, it may not serve as an effective approach for enhancing the performance of conventional coated tools. Nonetheless, the inherent capability of this technique in inhibiting cobalt diffusion is strategically harnessed to pioneer the development of a derivative technique referred to as the "low-temperature to high-temperature HFCVD (LT-HT-HFCVD)". This innovative method leverages a low-temperature deposited diamond layer as an intermediate layer to impede cobalt diffusion while serving as a densely nucleated layer for subsequent diamond growth. Subsequently, the conventional technique is employed to facilitate an effective growth rate and maintain high growth purity. The diamond-coated tools generated by this technique are subject to a comprehensive comparative analysis against those generated by low-temperature HFCVD (LT-HFCVD) and conventional HFCVD (CT-HFCVD) techniques. The results reveal that tools fabricated using the LT-HT-HFCVD combine the advantages inherent to both the LT-HFCVD and CT-HFCVD techniques, thereby manifesting superior toughness, enhanced film-substrate adhesive strength, and outstanding cutting performance.

Deposition of Diamond Film on Ferrous Alloys Substrate with Au/Cu Interlayer by HFCVD

Deposition of diamond film on ferrous alloys substrate with Au/Cu interlayer by hot-filament chemical vapor deposition

Deposition of an adherent diamond film on stainless steel using Cr/CrAlN as an interlayer

Deposition of DF on cemented tungsten carbide inserts with an electroplating multiple nickel and buckytube layer

Deposition of diamond film on steel substrate by precoating an intermediate layer

Mechanism of Diamond Nucleation Enhancement by Filament Carburization in HFCVD Process

High quality nanocrystalline diamond films grown by RF-HFCVD

Preparation of Diamond Films by Hot Filament Chemical Vapor Deposition and Nucleation by Carbon Nanotubes

High Efficiency Deposition of Diamond Film by Hot Filament Chemical Vapor Deposition

Low-Temperature Growth Of Ultra-Thin Nano-Crystalline Diamond Films By Hfcvd In A Ch4/H-2 Mixture

Diamond-like Carbon Film on 20 CrNiMo Steel Prepared by Hollow-Cathode Glow Discharge

Preparation and Characterization of Ultrananocrystalline Diamond Films in H 2 /ar/ch 4 Gas Mixtures System with Novel Filament Structure

An investigation into low-temperature HFCVD and derivative techniques for the enhancement of diamond-coated cemented carbide tool performance

Morphologies and structures of chemical vapor deposited diamond films and film-substrate interfaces

Direct coating adherent diamond films on Fe-based alloy substrate: the roles of Al, Cr in enhancing interfacial adhesion and promoting diamond growth

Nucleation of Diamond on Silicon Wafers Using C 60 in the Hot Filament Chemical Vapour Deposition System

Highly Transparent Nanocrystalline Diamond Films On Quartz Substrates

Electrodeposition, microstructure, friction and electrochemical behavior of diamond-like carbon (DLC) films with Ni/Cu interlayer

Deposition of a CVD diamond coating on a carbonized VO2 film

Growth and characterization of chemical vapor deposition diamond coating incorporated amorphous carbon with high Raman bands induced by CuO particles

Diamond coatings on copper surfaces through interface engineering