Comparison and Optimization of Datasheet-Driven Extraction of Gate-Drain Overlap Oxide Capacitance in IGBT Modeling

Yuwei Wu,Laili Wang,Jianpeng Wang,Zenan Shi,Jin Zhang
DOI: https://doi.org/10.1109/tpel.2022.3194023
IF: 5.967
2022-01-01
IEEE Transactions on Power Electronics
Abstract:Extracting gate-drain overlap oxide capacitance ( C oxd ) is a necessary step for almost all kinds of insulated-gate bipolar transistor (IGBT) compact models. There are two datasheet-driven methods that are universally accepted, one is based on reverse capacitance voltage characteristics ( C–V method), and the other uses gate charge characteristics ( Q–V method). This letter is to reveal the underlying mechanism of these two methods. It is found that the C–V method has an inescapable shortcoming which will mistake the turn- off delay time forecasted by IGBT models. In this letter, the internal capacitance system of IGBT is modeled and demonstrated completely. Based on this model, the accuracy and feasibility of the C–V and Q–V methods are analyzed. Moreover, the effect of C oxd on IGBT compact models is studied and further verified by experiments and circuit simulations.
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