Diffusion and Adsorption of Precursor Gas in Foam Nickel Rod Substrate During CVD Process for Deposition of Graphene

Bo Tang,Guoxin Hu,Dong Huang
DOI: https://doi.org/10.18689/mjai-1000104
2016-01-01
Abstract:Preparation of graphene by chemical vapor deposition (CVD) mehtod has attracted increasing attention due to the high quality of the resulting samples. However, the relative research on diffusion and adsorption of precursor gas (the first two steps of graphene growth) on the transition metal surface is still insufficiently. In this study, three-dimensional graphene networks (3DGNs) is prepared by CVD approach with a foam nickel rod (FNR) as the template. The diffusion of CH 4 in the FNR is discussed. Then, the adsorption of CH 4 on the FNR surface is studied by the expended Langmuir equation, and the influences from H 2 on the coverage ratio of CH 4 and thickness of the resutling 3DGNs is analyzed. In order to describe the dissolution-segregation process of carbon atoms in the FNR , a parameter named “quasi-diffusivity” is proposed to avoid the tedious calculation. Based on this parameter, the relationship between the scale of 3DGNs and growth time can be simulated, and the relationship b etween the thickness of samples and their growth position can be predicted.
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