Chemical vapor deposition (CVD) growth of graphene films

O. Frank,M. Kalbac
DOI: https://doi.org/10.1533/9780857099334.1.27
2014-01-01
Graphene
Abstract:The challenges and recent achievements in the chemical vapor deposition (CVD) production of graphene on nickel and copper substrates are reviewed. The formation of large-area monolayer domains, growth on single crystals and controlled formation of ordered multilayers are discussed in detail. Isotopic labeling is introduced as a tool to perform advanced studies on CVD graphene.
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