Growth Mechanism of 3D Graphene Materials Based on Chemical Vapor Deposition

Cheng Tang
DOI: https://doi.org/10.1007/978-981-16-0356-3_2
2021-01-01
Abstract:Chemical vapor deposition (CVD) is one of the most effective means to prepare high-quality graphene materials. By changing the energy supply method, the composition and morphology of the substrate, the composition and flow rate of the gas, and the temperature and pressure of the reaction, we can effectively adjust the number of graphene layers, the crystal domain size, stacking form, defect density, and heteroatom doping, which can tune the intrinsic physical properties of obtained graphene materials for various application requirements.
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