In Situ Investigating the Mechanism of Graphene Growth by Chemical Vapor Deposition

Luyang Wang,Runze Lai,Lichen Zhang,Mengqi Zeng,Lei Fu

DOI: https://doi.org/10.1021/acsmaterialslett.1c00783

IF: 11.4

2022-02-28

ACS Materials Letters

Abstract:Controlled synthesis of graphene via chemical vapor deposition (CVD) is critical for its practical application. The in-depth understanding of the growth mechanism can effectively promote the fundamental research and guide the synthesis of graphene. In situ characterization techniques allow real-time monitoring the dynamic growth processes, which are expected as powerful tools to provide multiscale insights into reaction procedures and mechanisms under real-time conditions. In this Review, we will give a brief introduction of in situ techniques used to capture the growth processes of graphene. On this basis, the growth mechanism will be discussed. Finally, we will conclude the Review with insights into the challenges and future prospects in this emerging research field.

materials science, multidisciplinary