Development of P-I-n Radiation Detectors Based on Semi-Insulating 4H-Sic Substrate Via Dual-Face Ion Implantation

Qunsi Yang,Qing Liu,Weizong Xu,Dong Zhou,Fangfang Ren,Rong Zhang,Youdou Zheng,Hai Lu
DOI: https://doi.org/10.1016/j.sse.2021.108196
IF: 1.916
2022-01-01
Solid-State Electronics
Abstract:To explore the potential of semi-insulating (SI) SiC substrate for radiation detector applications, p-i-n diodes with thick depletion layers are fabricated by using a dual-face ion implantation technique on SI 4H-SiC substrate. The Poole-Frenkel (P-F) emission is found responsible for the reverse leakage current transport of the p-i-n diode at elevated temperatures. The derived emission barrier height is likely induced by the residual boron-related shallow-level states, which are located - 0.3 eV above the top of the valence band. Detection tests of alpha-particles are performed on each side of the p-i-n detector to determine the location of the depleted region, which reveals weak p-type conduction of the SI 4H-SiC substrate after high temperature post-implantation annealing. The energy resolution of the detector operating in photovoltaic mode is - 4.3%, which would degrade at higher biases. The saturated charge collection efficiency (CCE) of - 99% for detection of 5.48 MeV alpha-particles is obtained as reverse bias exceeds 80 V.
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