Polarization-induced Hole Doping for Long-Wavelength In-rich InGaN Solar Cells

Liwen Sang,Masatomo Sumiya,Meiyong Liao,Yasuo Koide,Xuelin Yang,Bo Shen
DOI: https://doi.org/10.1063/5.0071506
IF: 4
2021-01-01
Applied Physics Letters
Abstract:The lack of high-quality In-rich p-type InGaN restricts the development of high-efficiency InGaN solar cells toward the whole solar spectrum. In this work, we report a polarization-induced (PI) hole doping method for In-rich InGaN by using the In composition graded p-type InGaN layer with lightly Mg doping. The hole mobility as high as ∼40 cm2/V s is obtained, which is more than ten time higher than that of the single-layer p-type InGaN with the same average In mole fraction. The In-rich InxGa1−xN (x ∼ 0.4) solar cell with the PI doped p-type InGaN exhibits a peak absorption at the wavelength as long as 594 nm. As a result, the conversion efficiency of InGaN solar cell is improved by over 1.5 times compared to that with single-layer p-type InGaN.
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