Error Analysis of the Geometric Self-Calibration of the Grating Interferometer System for the Wafer Stage

Weinan Ye,Leijie Wang,Ming Zhang,Yu Zhu,Jinchun Hu,Xin Li,Chuxiong Hu
DOI: https://doi.org/10.1109/wcmeim48965.2019.00161
2019-01-01
Abstract:Geometric self-calibration of the grating interferometer system is essential to improve the displacement measurement accuracy of the wafer stage, and the error analysis is critical for geometric self-calibration. The self-calibration idea based on the self-consistency of a redundant system and the step-by-step self-calibration method of the grating interferometer system for the wafer stage are briefly introduced. The error sources destroying the self-consistency of the geometric mathematical model are analyzed and transformed into the phase shift errors caused by non-geometric errors. The relationship between the accuracy of the model after self-calibration and the phase shift errors is established by fitting the simulation data and can be used as a basis for the design and accuracy budget of the self-calibration process of the grating interferometer system for the wafer stage.
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