Abstract:Photolysis of aminopolycarboxylates with C 60 has been shown to be an effective method for the preparation of isomerically pure fullerene derivatives.A series of fullerroaminopolycar boxylate derivatives have been prepared by this method.For example,glycine esters react with C 60 to give C 60 (ROOCCHNHCHCOOR),the mechanism of which is proposed to involve complicated bond breaking and formation processes.Aminoacid esters with secondary and tertiary amino groups can add to C 60 by simply losing two H atoms.Irradiation of tetramethyl ethylenediaminetetraacetate(EDTA) with C 60 yields the EDTA containing fullerene monoadduct C 60 (MeOOCCH) 2NCH 2CH 2N(CH 2COOMe) 2.Compared to well known 1,3 dipole addition method of fulleropyrrolidine preparation,the photoreaction reported here avoids the use of aldehydes or ketones and is specially suited for the preparation of the fullerene containing complexones such as the EDTA C 60 derivative.Langmuir Blodgett film formation and the photoelectric properties of these fulleropyrrolidine ccompounds are investigated.Due to the presence of hydrophilic groups the derivatives form stable and transferable monolayer.By using metal ion sonlution as the subphase,metal complexes of the fullerocarboxylic derivatives are prepared at the air/water interface.Photoelctrical behavior of the LB film fabricated on ITO are studied under various conditions.For most of the compounds electrons flow from the electrolyte through the LB film to the ITO.The quantum yield of the fullerene derivatives can reach 8%.

Electron Beam Induced Fragmentation of Fullerene Derivatives

Systematic Studies of Fullerene Derivative Electron Beam Resists

Exposure mechanism of fullerene derivative electron beam resists

Electron-Beam-Induced Fragmentation In Ultrathin C-60 Films On Si(100)-2x1-H: Mechanisms Of Cage Destruction

A Fullerene Derivative As an Electron Beam Resist for Nanolithography

Fragmentation of C60 Molecules in Partially Ionized Fullerene Beam Deposition

Deposition of C60 Films by Partially Ionized Fullerene Beams

Functionalization of Fullerene for Electron Beam Nanolithography Resist.

Fullerene Derivatives as Novel Resist Materials for Fabrication of MEMS Devices by Electron Beam Lithography

Electron-beam Damage of C60 Films on Hydrogen-Passivated Si(100)

Multiple ionization and fragmentation of fullerene dimers by highly charged ion impact

Laser Desorption Mass Spectroscopic Study of Fullerene Coalescence and Aggregation in Reactive and Non-Reactive Polymer Films

A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist

Chemically Amplified Phenolic Fullerene Electron Beam Resist

Femtosecond-resolved observation of the fragmentation of buckminsterfullerene following X-ray multiphoton ionization

A High Resolution Water Soluble Fullerene Molecular Resist for Electron Beam Lithography

Enhanced coalescence reactions of fullerenes by laser desorption of C60 derivatives

Fullerene and Nanoparticle Formation in Carbon Cathodic Arc Deposition

Studies of C-60 Films Deposited Using Ionized Cluster Beam Deposition Technique

Mass Spectrometric Investigation of the Aggregation and Coalescence of Fullerenes in C60-modified Poly (N-Vinylcarbazole) by UV-laser Ablation

Photochemical Synthesis of Fulleromulticarboxylates and Their Langmuir Blodgett Film Formation