Deposition of C60 Films by Partially Ionized Fullerene Beams

ZM REN,XX XIONG,YC DU,ZF YING,LY CHEN,FM LI
DOI: https://doi.org/10.1063/1.359504
IF: 2.877
1995-01-01
Journal of Applied Physics
Abstract:C60 films have been deposited by partially ionized cluster beam deposition in which a C60 beam is partially ionized by electron impact and then accelerated by an acceleration field Va towards the substrate where the films are deposited. The experimental results show that the ionized C60 molecules in the evaporated beam are fragmented upon collision with the substrate under the elevated accelerating fields Va. Particularly, as Va exceeds about 400 V, almost all the C60 molecules including ionized and unionized ones are broken into fragments in the deposition films and the resulting films turn out to be amorphous carbon layers, as indicated by the measurements of Raman spectra, x-ray diffraction, and ellipsometry.
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