In-Situ Reaction Deposition Of Alumina Ceramic Film By Laser-Induced Vacuum Arc

Hq Li,Tm Shao,S Dao,Wd Yuan,Dr Chen
2002-01-01
Abstract:Laser arc is a thin film deposition technique using a pulsed arc plasma source ignited on the cathode by a pulse laser. The limitations of arc burning time and arc pulsing with a high frequency reduce the temperature loading of the targets materials, the possibility of melting and finally the emission of microparticles. Using cold-pressed compact of diaspore powders as cathode target, hard alumina films of high quality are deposited on a silicon slice up to a thickness of 50 nm The film thickness and surface topography are determined by atomic force microscopy. The chemical element and phase composition of the films are analyzed using X-ray photoelectron spectroscopy and X-ray diffraction.
What problem does this paper attempt to address?