The Simulation Study On 1/F Noise In Mos Device Under Proton Irradiation

Zhong Kun,Cheng Guo Sheng,Yuan Shun Zhou,Zhao Lei
2010-01-01
Abstract:This paper investigated the relationship between the 1/f noise and the defect in MOS device under proton irradiation by simulation method. The 1/f noise was thought to be related with the interface defect of Si/SiO(2). We simulated the displacement per atom (DPA) around the interface by SRIM code. The energy of irradiational particle ranged from 400 to 3000 eV. The theoritical result showed that the noise power spectra reached the maximum value at the energy of 600 keV. This result contributed to value the durability of MOS device under particle irradiation.
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