High Reliability Of Igzo Tfts Using Low-Temperature Fabricated Organic Passivation Layers

Huiling Lu,Ting Liang,Shengdong Zhang
DOI: https://doi.org/10.1109/icsict.2016.7998999
2016-01-01
Abstract:We proposed and fabricated amorphous indium-gallium-zinc-oxide thin-film transistors (IGZO TFTs) employing a novel organic-passivation layer (1-Methoxy-2-Propanol positive resist). The 1-Methoxy-2-Propanol passivated TFTs exhibit almost non-degraded electrical properties with carrier mobility, subthreshold swing of 5.9 cm(2)/Vs, 0.38 V/dec, respectively compared to the unpassivated TFTs. Besides, the Vth shift of 1-Methoxy-2-Propanol passivated TFTs under negative bias stress (NBS) is remarkably reduced compared to the unpassivated TFTs and the hump effect disappears. What is more, the passivation layer was fabricated at low temperature. Therefore, it is a promising candidate for advanced flexible displays.
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