Abstract:The integration of two-dimensional (2D) materials with functional non-2D materials such as metal oxides is of key importance for many applications, but underlying mechanisms for such non-2D/2D interfacing remain largely elusive at the atomic scale. To address this, we here investigate the nucleation stage in atomic layer deposition (ALD) of the important metal oxide HfO2 on chemical vapor deposited graphene using atomically resolved and element specific scanning transmission electron microscopy (STEM). To avoid any deleterious influence of polymer residues from pre-ALD graphene transfers we employ a substrate-assisted ALD process directly on the as grown graphene still remaining on its Cu growth catalyst support. Thereby we resolve at the atomic scale key factors governing the integration of non-2D metal oxides with 2D materials by ALD: Particular to our substrate-assisted ALD process we find a graphene-layer-dependent catalytic participation of the supporting Cu catalyst in the ALD process. We further confirm at high resolution the role of surface irregularities such as steps between graphene layers on oxide nucleation. Employing the energy transfer from the scanning electron beam to in situ crystallize the initially amorphous ALD HfO2 on graphene, we observe HfO2 crystallization to non-equilibrium HfO2 polymorphs (cubic/tetragonal). Finally our data indicates a critical role of the graphene's atmospheric adventitious carbon contamination on the ALD process whereby this contamination acts as an unintentional seeding layer for metal oxide ALD nucleation on graphene under our conditions. As atmospheric adventitious carbon contamination is hard to avoid in any scalable 2D materials processing, this is a critical factor in ALD recipe development for 2D materials coating. Combined our work highlights several key mechanisms underlying scalable ALD oxide growth on 2D materials.

Study of Roughness Evolution and Layer Stacking Faults in Short-Period Atomic Layer Deposited Hfo2/Al2o3 Multilayers

Microstructure Optimization and Optical and Interfacial Properties Modulation of Sputtering-Derived Hfo2 Thin Films by Tio2 Incorporation

Surface smoothing effect of an amorphous thin film deposited by atomic layer deposition on a surface with nano-sized roughness

Low Temperature Formation of Higher-K Cubic Phase Hfo2 by Atomic Layer Deposition on Geox/Ge Structures Fabricated by In-Situ Thermal Oxidation

Evolution of residual stress and interface coherency and their impact on deformation mechanisms in Al/Ti multilayers

Thermal Stability, Structural and Electrical Characteristics of the Modulated Hfo2/Al2o3 Films Fabricated by Atomic Layer Deposition

Characterization of Hfo2/La2o3 Layered Stacking Deposited on Si Substrate

Growth Mode Evolution of Hafnium Oxide by Atomic Layer Deposition

Unraveling the Discrepancies in Size Dependence of Hardness and Thermal Stability in Crystalline/amorphous Nanostructured Multilayers: Cu/Cu-Ti Vs. Cu/HfO2

Optimization of $Al/AlO_x/Al$-Layer Systems for Josephson Junctions from a Microstructure Point of View

Characterization of the Interface Between the Hf-based High-K Thin Film and the Si Using Spatially Resolved Electron Energy-Loss Spectroscopy.

Resolving the Nucleation Stage in Atomic Layer Deposition of Hafnium Oxide on Graphene

In-situ quantification of the surface roughness for facile fabrications of atomically smooth thin films

X-ray scattering of periodic and graded multilayers: comparison of experiments to simulations from surface microroughness characterization

Characterization of Micro-Roughness Parameters and Optical Properties of Obliquely Deposited HfO2 Thin Films

Atomic Layer Deposition of High Quality HfO2 Using In-Situ Formed Hydrophilic Oxide As an Interfacial Layer

Thin-Film Engineering of Mechanical Fragmentation Properties of Atomic-Layer-Deposited Metal Oxides

Advanced measurement and diagnosis of the effect on the underlayer roughness for industrial standard metrology

Effect of deposition substrates on surface topography, interface roughness and phase transformation of the Al/Ni multilayers

Characterization of Al2O3 and HfO2 Grown on Metal Surfaces with Thermal and Plasma Enhanced Atomic Layer Deposition

Atomic layer engineering of perovskite oxides for chemically sharp heterointerfaces