Room-temperature Sputtered Tungsten-Doped Indium Oxide for Improved Current in Silicon Heterojunction Solar Cells

Can Han,Yifeng Zhao,Luana Mazzarella,Rudi Santbergen,Ana Montes,Paul Procel,Guangtao Yang,Xiaodan Zhang,Miro Zeman,Olindo Isabella
DOI: https://doi.org/10.1016/j.solmat.2021.111082
2021-01-01
Abstract:The window layers limit the performance of silicon heterojunction (SHJ) solar cells with front and back contacts. Here, we optimized tungsten-doped indium oxide (IWO) film deposited by radio frequency magnetron sputtering at room temperature. The opto-electrical properties of the IWO were manipulated when deposited on top of thin-film silicon layers. The optimal IWO on glass shows carrier density and mobility of 2.1 x 10(20) cm(-3) and 34 cm(2) V(-1)s(-1), respectively, which were tuned to 2.0 x 10(20) cm(-3) and 47 cm(2) V(-1)s(-1), as well as 1.9 x 10(20) cm(-3) and 42 cm(2) V(-1)s(-1), after treated on i/n/glass and i/p/glass substrates, respectively. Using the more realistic TCO data that were obtained on thin-film silicon stacks, optical simulation indicates a promising visible-to-near-infrared optical response in IWO-based SHJ device structure, which was demonstrated in fabricated devices. Additionally, by adding an additional magnesium fluoride layer on device, the champion IWO-based SHJ device showed an active area cell efficiency of 22.92%, which is an absolute 0.98% efficiency gain compared to the ITO counterpart, mainly due to its current gain of 1.48 mA/cm(2).
What problem does this paper attempt to address?