Abstract:The ablation threshold, depth and crater shape of fused silica for femtosecond laser processing are investigated theoretically and experimentally. Based on tracking the spatiotemporal distribution of the free electron density, free electron temperature, and laser intensity, the electron dynamics as well as the transient optical and thermophysical properties of femtosecond laser irradiated fused silica are quantitatively determined. The numerical model is validated by comparing the calculated threshold fluence, depth and crater shape of ablation with the experimentally measured ones at a wavelength of 800 nm. The free electron relaxation time at different laser fluences and pulse durations throughout the photoionization process and impact ionization process are probed. In the present work, the findings are as follows. 1) The electron relaxation time significantly affects the material optical properties and femtosecond laser energy absorption. The optical properties change dramatically. The fused silica becomes opaque for the case of laser irradiation with fluence higher than the ablation threshold. Moreover, the transition from electron-phonon collision to electron-ion collision accompanies with the femtosecond laser ablation of fused silica. 2) By using the proposed model, the experimentally observed saturation of ablation depth at high laser fluence is elucidated by the significant change of optical reflectivity and absorption coefficient. Both the results of theoretical simulation and experimental observation indicate that laser fluence has a strong influence on the shape of the ablation crater. The ablation volume increases sharply with the increase of laser fluence for femtosecond laser irradiation, compared with that for picosecond laser irradiation. 3) With the increase of femtosecond laser fluence, the ablation depth removal efficiency and ablation efficiency are both saturated, followed by slight decrements. The peak of ablation depth removal efficiency peak occurs at the femtosecond laser fluence close to 1.4 times of the ablation threshold. While the accuracy is slightly low due to the higher sensitivity of the ablation characteristics (ablation crater depth and ablation volume) to the shorter femtosecond laser pulse. For the femtosecond laser fluence higher than 3.5 times of the ablation threshold, good repeatability over a very wide fluence range can achieve accurate processing results, because a more consistent flat-bottom ablation profile tends to appear. However, the heat-affected zone leads the processing quality to degrade, compared with the scenario of femtosecond laser fluence close to the ablation threshold.

Influence of femtosecond laser resonant absorption on ablation threshold fluency of Pr-Nd doped silicate glass

Resonant Ablation Rules of Femtosecond Laser on Pr–Nd Doped Silicate Glass

Resonant Effects in Nonlinear Photon Absorption During Femtosecond Laser Ablation of Nd-doped Silicate Glass.

Ablation Efficiency of a Novel Thulium Fiber Laser: an in Vitro Study on Laser Setting and Fiber Usage.

Theoretical and Experimental Research of Femtosecond Laser Processing Fused Silica

Study on Ablation Threshold of Fused Silica by Liquid-Assisted Femtosecond Laser Processing.

The ablation process induced by femtosecond laser in transparent dielectrics

Doping Transition Metal Ions As A Method for Enhancement of Ablation Rate in Femtosecond Laser Irradiation of Silicate Glass

Experimental Study on 800 Nm Femtosecond Laser Ablation of Fused Silica in Air and Vacuum

Controlling of Surface Ablation Threshold of Fused Silica by Double-Pulsed Femtosecond Laser

Numerical Simulation of Femtosecond Laser Ablation of Quartz Glass and Silicon Nitride

Ablation Of Crystalline Oxides By Infrared Femtosecond Laser Pulses

Spatiotemporal Probe into the Femtosecond Laser Processing of Fused Silica

Influence of erbium doping on the femtosecond laser damage characteristics of fluorozirconate glasses

Effect of laser ablation on the conductivity and laser-induced damage threshold of fused silica components

Ultrashort pulse laser ablation of dielectrics: Thresholds, mechanisms, role of breakdown

Study on Ablation Behaviors and Ablation Rates of a 193nm ArF Excimer Laser System for Selected Substrates in LA-ICP-MS Analysis

An investigation on 800 nm femtosecond laser ablation of K9 glass in air and vacuum

Ablation Mechanism of Fused Silica under Femtosecond Laser Pulse

Mechanisms In Fs-Laser Ablation In Fused Silica

Micro-ablation at the front and rear surfaces of a fused silica window by using a femtosecond laser pulse in air