Study on Epitaxial Growth of Pyrochlore Structure of La 2 Zr 2 O 7 Thin Film

Jian-qing FENG,Yao WANG,Cheng-shan LI,Ze-ming YU,Li-hua JIN,Hui WANG,Zheng-bing XU,Ping-xiang ZHANG
DOI: https://doi.org/10.3969/j.issn.1008-5564.2015.04.001
2015-01-01
Abstract:In this paper, The La2 Zr2 O7 ( LZO) oxide thin film with pyrochlore structure was fabricated on bi-axial textured NiW substrates by chemical solution deposition ( CSD) method, and the influence of elevated temperature routes on epitaxial growth behavior of LZO films during the heat-treatment process was studied. The texture and surface morphology of LZO thin films under different heat treatments were characterized by X-ray diffraction (XRD) and a-tomic force microscopy (AFM). The result indicates that the elevated temperature rate has an important effect on the texture degree and surface morphology of LZO thin films on metallic sub-strates. It can be considered that LZO thin films with sharp texture degree and smooth surface could be obtained by choosing an appropriate heat-treatment route using CSD method. Moreo-ver, LZO thin film fabricated at the optimal heat-treatment condition is suitable to be used as the buffer layer for coated conductors.
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