Compatibility Study on Growing High Quality Modulation Doped GaAs and InP/InP Epilayers by Solid Source Molecular Beam Epitaxy

ZHANG Guan-jie,SHU Yong-chun,PI Biao,XING Xiao-dong,LIN Yao-wang,Yao Jiang-Hong,WANG Zhan-guo,XU Jing-jun
DOI: https://doi.org/10.3969/j.issn.1000-985x.2005.03.003
2005-01-01
Abstract:The modulation-doped AlGaAs/GaAs structures ( MD-GaAs ) and InP/InP epilayers have been grown by solid-source molecular beam epitaxy(SSMBE) system. After growing phosphorous contained materials, growth conditions were seriously deteriorated, but by using an appropriate method and optimized growth conditions via Hall measurements, 77K electron mobility of 1.86 × 105cm2/Vs for modulationdoped AlGaAs/GaAs structures, 2.09 × 105cm2/Vs for δ-doping Si:AlGaAs/GaAs structures, 4.57 ×104 cm2/Vs for InP/InP epilayers were achieved. The results show that the InP layer with thickness less than 2.5μm is a material with the highest mobility and the lowest electron concentration reported up to date. It comes true that alternative growth of high quality modulation doped GaAs and phosphorous contained materials (P-contained) in same SSMBE system can be successfully realized.
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