Effects of Experimental Conditions on the Properties of Nanoporous Silica Films

WANG Juan,ZHANG Chang-rui,FENG Jian
DOI: https://doi.org/10.3969/j.issn.1001-2486.2005.03.004
2005-01-01
Abstract:AbstrcatCrack-free homogeneous nanoporous silica films on silicon wafers has been synthesized via a supercritical drying of wet gel films that were obtained by spinning coating the polymeric silica sol using acid/base two step sol-gel method with tetraethoxysilane(TEOS) as precursor. The nanoporous film is amorphous and three-dimensioned network, cross-linked by the primary particles which sizes distributed between 30~40nm showed by XRD and AFM. The thickness and refractive index of the silica films were measured by spectroscopic ellipsometry. The silica films' thickness is 300~1100nm, refractive index is 1.13~1.23, porosity is 50%~70% and dielectric constant is 1.9~2.4. The silica films' thickness increases as the solvent isopropanol (IPA) amount reduced, catalyst NH_4OH amount increased, SiO_2 sol viscosity increased and spin speed reduced. The films' dielectric constant loweres as NH_4OH amount and SiO_2 sol viscosity increases while IPA amount and spinning speed has little effect on the films' dielectric constant.
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