First Principles Study of Silicane Decomposition on Copper Surface

Duo WANG,Jia LI
DOI: https://doi.org/10.3969/j.issn.1671-0460.2017.12.007
2017-01-01
Abstract:First principles calculations using density functional theory were performed on the decomposition process of silicane on three different copper surfaces: Cu(111), Cu(100) and Cu(110). The stable adsorption configurations of reactants, products and intermediates on copper surface in four reaction processes were determined. In consideration of thermodynamics, we found that all reactions are exothermic and the first reaction step (SiH4→SiH3+H) is the easiest reaction. So it's predicted that, in the process of chemical vapor deposition, SiH4 is difficult to exist on the copper surface.
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