Density functional theory study on the atomic structure and electronic states of Cu(l00) (√2 × 2 √2)R45°-O surface

Jianqiu Cai,Xiangming Tao,Wenbin Chen,Xinxin Zhao,Mingqiu Tan
2005-01-01
Abstract:The surface structure, relaxation, and oxygen adsorbed (√2 × 2√2) R45° Cu(l00) surface are studied by ab initio total energy calculation. The calculated atomic structure for the Cu(100) (√2 × 2√2)R45°-0 surface is quite close to the experiments except the positions of surface layer Cu atoms. The adsorbed 0 atoms is lying approximately 0.02 nm above the outermost Cu layer and produces a hybridized band and yields some localized surface states around 6.4 eV below E F. The calculated work function for studied oxygen adsorbed surface phase is 4.58 eV, which is close to that of clear Cu(100) surface (-4.53 eV). It is concluded that the bonding between adsorbate and substrate copper atoms is approximately limited to the first surface layer.
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