Abstract:For supported catalysts, the particle surface or metal-support interface and its vicinity are the main areas providing active sites. In this regard, surface and interface engineering of heterogeneous catalysts is effective and critical for optimizing their catalytic performances. During the formation of active components, the structural uniformity, stability and location of nucleation sites determine the structural and scale uniformity, stability and environmental consistency of active sites, and ultimately determine their catalytic performance. Therefore, the regulation of nucleation, growth and location of active components is the key to precisely regulate the surface and interface structure and properties of supported catalysts. However, traditional preparation methods (such as impregnation method and precipitation method) have limitations in precise regulation of particle size, location and microstructure of catalysts due to the surface heterogeneity of supports and the high surface energy of nanoparticles, which makes it difficult to reliably reveal the structure-activity relationship of the catalyst. Therefore, the development of advanced fabrication methods is of vital significance to realize the nucleation, growth and location regulation of heterogeneous catalysts at atomic level precision. Atomic layer deposition (ALD) is a powerful scientific tool for catalytic research due to its self-limiting, atom-by-atom growth features. However, there is still a lack of rational knowledge of the nucleation and growth mechanism of catalytic particles prepared by ALD, the microscopic mechanism of interface structure modification, and the catalytic reaction mechanism. This is the topic of this lecture, in which we discuss the latest progress made in our group in precisely regulating the microstructure, size and location of ALD-deposited active components by several effective methods including nucleation site engineering, deposition kinetics engineering and template-assisted ALD method, as well as elucidating the nucleation and growth mechanism of ALD-deposited active components by in-situ and operando XAFS characterization based on our designed and built ALD-XAFS device. Through the above works, the nucleation and growth mechanisms of the deposited species and modification species, the microscopic mechanism of interface structure modification, and the influence of the size effect, the interface effect, and the distance effect on the catalytic performance were clarified. The structure-activity relationship was understood at the atomic/molecular level. These works will provide new ideas and scientific basis for the catalyst design and the performance regulation.

On the Mechanism of the Atomic Layer Deposition of Cu Films on Silicon Oxide Surfaces: Activation Using Atomic Hydrogen and Three-Dimensional Growth

Impact of Surface Hydroxyl Groups on CuO Film Growth by Atomic Layer Deposition

Chemical Vapor Deposition Mechanism of Copper Films on Silicon Substrates

Metal Exchange and Diffusion during Atomic Layer Deposition of Cobalt and Nickel Sulfides

Initial Growth and Agglomeration During Atomic Layer Deposition of Nickel Sulfide

The surface chemistry of the atomic layer deposition of metal thin films

First-Principles Predictions and in Situ Experimental Validation of Alumina Atomic Layer Deposition on Metal Surfaces

In Situ X-Ray Photoelectron Spectroscopy Analysis of the Atomic Layer Deposition of Al2O3 on SiO X /si: Interface Dipole and Persistent Surface Groups

Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma

Interfacial Catalysis in and Initial Reaction Mechanism of Al2o3 Films Fabricated by Atomic Layer Deposition Using Non-Hydrolytic Sol-Gel Chemistry

Thermal ALD of Cu via reduction of Cu xO films for the advanced metallization in spintronic and ULSI interconnect systems

Surface Chemistry During Atomic-Layer Deposition of Nickel Sulfide from Nickel Amidinate and H2S

Microstructure-dependent Conformal Atomic Layer Deposition on 3D Nanotopography.

Reaction mechanism of atomic layer deposition of aluminum sulfide using trimethylaluminum and hydrogen sulfide

Atomic Layer Deposition of Noble Metals – New Developments in Nanostructured Catalysts

In situ x-ray photoelectron spectroscopy analysis of the atomic layer deposition of Al 2 O 3 on SiO x /Si: Interface dipole and persistent surface groups.

Design and Self-catalytic Mechanism of Aluminum Precursors Bearing Amino Ligands for Al2S3 Atomic Layer Deposition

In-situ spectroscopic ellipsometry study of copper selective-area atomic layer deposition on palladium

Nucleation and growth of low resistivity copper thin films on polyimide substrates by low-temperature atomic layer deposition

(Invited) Nucleation, Growth and Location Regulation of Heterogeneous Catalysts Synthesized by Atomic Layer Deposition

Atomic layer deposition of copper and copper silver films using an electrochemical process